Impact of oxygen vacancy on the ferroelectric properties of lanthanum-doped hafnium oxide
The discovery of ferroelectric properties in hafnium oxide has brought back the interest in the ferroelectric non-volatile memory as a possible alternative for low power consumption electronic memories. As far as real hafnium oxide-based materials have defects like oxygen vacancies, their presence m...
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Veröffentlicht in: | Applied physics letters 2020-10, Vol.117 (16) |
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creator | Islamov, Damir R. Zalyalov, Timur M. Orlov, Oleg M. Gritsenko, Vladimir A. Krasnikov, Gennady Ya |
description | The discovery of ferroelectric properties in hafnium oxide has brought back the interest in the ferroelectric non-volatile memory as a possible alternative for low power consumption electronic memories. As far as real hafnium oxide-based materials have defects like oxygen vacancies, their presence might affect the ferroelectric properties due to oxygen atom movements during repolarization processes. In this work, the transport experiments are combined with the modeling to study evolution of the oxygen vacancy concentration during the endurance and to determine the optimal defect density for a higher residual polarization in lanthanum-doped hafnium oxide. |
doi_str_mv | 10.1063/5.0023554 |
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fullrecord | <record><control><sourceid>proquest_scita</sourceid><recordid>TN_cdi_proquest_journals_2451906525</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2451906525</sourcerecordid><originalsourceid>FETCH-LOGICAL-c327t-6deec835144adb530f44dea9184241f420ac24d0fb0664444153bed3669b63ac3</originalsourceid><addsrcrecordid>eNp9kEtLAzEUhYMoWKsL_0HAlcJo3u0spfgoFNzowlXI5GGndJIxyRT7701p0YXg3Vzu5bvnXA4AlxjdYiToHb9FiFDO2REYYTSZVBTj6TEYIYRoJWqOT8FZSqsyckLpCLzPu17pDIOD4Wv7YT3cKK283sLgYV5a6GyMwa6tzrHVsI-htzG3Nu0u1srnpfJDV5myNnCpnG-Hrii1xp6DE6fWyV4c-hi8PT68zp6rxcvTfHa_qDQlk1wJY62eUo4ZU6bhFDnGjFU1njLCsGMEKU2YQa5BQrBSmNPGGipE3QiqNB2Dq71u-e1zsCnLVRiiL5aSMI5rJDjhhbreUzqGlKJ1so9tp-JWYiR3yUkuD8kV9mbPJt1mldvgf-BNiL-g7I37D_6r_A3Pz3xF</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2451906525</pqid></control><display><type>article</type><title>Impact of oxygen vacancy on the ferroelectric properties of lanthanum-doped hafnium oxide</title><source>AIP Journals Complete</source><source>Alma/SFX Local Collection</source><creator>Islamov, Damir R. ; Zalyalov, Timur M. ; Orlov, Oleg M. ; Gritsenko, Vladimir A. ; Krasnikov, Gennady Ya</creator><creatorcontrib>Islamov, Damir R. ; Zalyalov, Timur M. ; Orlov, Oleg M. ; Gritsenko, Vladimir A. ; Krasnikov, Gennady Ya</creatorcontrib><description>The discovery of ferroelectric properties in hafnium oxide has brought back the interest in the ferroelectric non-volatile memory as a possible alternative for low power consumption electronic memories. As far as real hafnium oxide-based materials have defects like oxygen vacancies, their presence might affect the ferroelectric properties due to oxygen atom movements during repolarization processes. In this work, the transport experiments are combined with the modeling to study evolution of the oxygen vacancy concentration during the endurance and to determine the optimal defect density for a higher residual polarization in lanthanum-doped hafnium oxide.</description><identifier>ISSN: 0003-6951</identifier><identifier>EISSN: 1077-3118</identifier><identifier>DOI: 10.1063/5.0023554</identifier><identifier>CODEN: APPLAB</identifier><language>eng</language><publisher>Melville: American Institute of Physics</publisher><subject>Applied physics ; Ferroelectric materials ; Ferroelectricity ; Hafnium oxide ; Lanthanum ; Oxygen ; Power consumption ; Properties (attributes) ; Vacancies</subject><ispartof>Applied physics letters, 2020-10, Vol.117 (16)</ispartof><rights>Author(s)</rights><rights>2020 Author(s). Published under license by AIP Publishing.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c327t-6deec835144adb530f44dea9184241f420ac24d0fb0664444153bed3669b63ac3</citedby><cites>FETCH-LOGICAL-c327t-6deec835144adb530f44dea9184241f420ac24d0fb0664444153bed3669b63ac3</cites><orcidid>0000-0002-5188-7049 ; 0000-0003-1646-0848 ; 0000-0002-2092-7730</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://pubs.aip.org/apl/article-lookup/doi/10.1063/5.0023554$$EHTML$$P50$$Gscitation$$H</linktohtml><link.rule.ids>314,776,780,790,4498,27901,27902,76353</link.rule.ids></links><search><creatorcontrib>Islamov, Damir R.</creatorcontrib><creatorcontrib>Zalyalov, Timur M.</creatorcontrib><creatorcontrib>Orlov, Oleg M.</creatorcontrib><creatorcontrib>Gritsenko, Vladimir A.</creatorcontrib><creatorcontrib>Krasnikov, Gennady Ya</creatorcontrib><title>Impact of oxygen vacancy on the ferroelectric properties of lanthanum-doped hafnium oxide</title><title>Applied physics letters</title><description>The discovery of ferroelectric properties in hafnium oxide has brought back the interest in the ferroelectric non-volatile memory as a possible alternative for low power consumption electronic memories. As far as real hafnium oxide-based materials have defects like oxygen vacancies, their presence might affect the ferroelectric properties due to oxygen atom movements during repolarization processes. In this work, the transport experiments are combined with the modeling to study evolution of the oxygen vacancy concentration during the endurance and to determine the optimal defect density for a higher residual polarization in lanthanum-doped hafnium oxide.</description><subject>Applied physics</subject><subject>Ferroelectric materials</subject><subject>Ferroelectricity</subject><subject>Hafnium oxide</subject><subject>Lanthanum</subject><subject>Oxygen</subject><subject>Power consumption</subject><subject>Properties (attributes)</subject><subject>Vacancies</subject><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><recordid>eNp9kEtLAzEUhYMoWKsL_0HAlcJo3u0spfgoFNzowlXI5GGndJIxyRT7701p0YXg3Vzu5bvnXA4AlxjdYiToHb9FiFDO2REYYTSZVBTj6TEYIYRoJWqOT8FZSqsyckLpCLzPu17pDIOD4Wv7YT3cKK283sLgYV5a6GyMwa6tzrHVsI-htzG3Nu0u1srnpfJDV5myNnCpnG-Hrii1xp6DE6fWyV4c-hi8PT68zp6rxcvTfHa_qDQlk1wJY62eUo4ZU6bhFDnGjFU1njLCsGMEKU2YQa5BQrBSmNPGGipE3QiqNB2Dq71u-e1zsCnLVRiiL5aSMI5rJDjhhbreUzqGlKJ1so9tp-JWYiR3yUkuD8kV9mbPJt1mldvgf-BNiL-g7I37D_6r_A3Pz3xF</recordid><startdate>20201019</startdate><enddate>20201019</enddate><creator>Islamov, Damir R.</creator><creator>Zalyalov, Timur M.</creator><creator>Orlov, Oleg M.</creator><creator>Gritsenko, Vladimir A.</creator><creator>Krasnikov, Gennady Ya</creator><general>American Institute of Physics</general><scope>AAYXX</scope><scope>CITATION</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope><orcidid>https://orcid.org/0000-0002-5188-7049</orcidid><orcidid>https://orcid.org/0000-0003-1646-0848</orcidid><orcidid>https://orcid.org/0000-0002-2092-7730</orcidid></search><sort><creationdate>20201019</creationdate><title>Impact of oxygen vacancy on the ferroelectric properties of lanthanum-doped hafnium oxide</title><author>Islamov, Damir R. ; Zalyalov, Timur M. ; Orlov, Oleg M. ; Gritsenko, Vladimir A. ; Krasnikov, Gennady Ya</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c327t-6deec835144adb530f44dea9184241f420ac24d0fb0664444153bed3669b63ac3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2020</creationdate><topic>Applied physics</topic><topic>Ferroelectric materials</topic><topic>Ferroelectricity</topic><topic>Hafnium oxide</topic><topic>Lanthanum</topic><topic>Oxygen</topic><topic>Power consumption</topic><topic>Properties (attributes)</topic><topic>Vacancies</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Islamov, Damir R.</creatorcontrib><creatorcontrib>Zalyalov, Timur M.</creatorcontrib><creatorcontrib>Orlov, Oleg M.</creatorcontrib><creatorcontrib>Gritsenko, Vladimir A.</creatorcontrib><creatorcontrib>Krasnikov, Gennady Ya</creatorcontrib><collection>CrossRef</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Islamov, Damir R.</au><au>Zalyalov, Timur M.</au><au>Orlov, Oleg M.</au><au>Gritsenko, Vladimir A.</au><au>Krasnikov, Gennady Ya</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Impact of oxygen vacancy on the ferroelectric properties of lanthanum-doped hafnium oxide</atitle><jtitle>Applied physics letters</jtitle><date>2020-10-19</date><risdate>2020</risdate><volume>117</volume><issue>16</issue><issn>0003-6951</issn><eissn>1077-3118</eissn><coden>APPLAB</coden><abstract>The discovery of ferroelectric properties in hafnium oxide has brought back the interest in the ferroelectric non-volatile memory as a possible alternative for low power consumption electronic memories. As far as real hafnium oxide-based materials have defects like oxygen vacancies, their presence might affect the ferroelectric properties due to oxygen atom movements during repolarization processes. In this work, the transport experiments are combined with the modeling to study evolution of the oxygen vacancy concentration during the endurance and to determine the optimal defect density for a higher residual polarization in lanthanum-doped hafnium oxide.</abstract><cop>Melville</cop><pub>American Institute of Physics</pub><doi>10.1063/5.0023554</doi><tpages>5</tpages><orcidid>https://orcid.org/0000-0002-5188-7049</orcidid><orcidid>https://orcid.org/0000-0003-1646-0848</orcidid><orcidid>https://orcid.org/0000-0002-2092-7730</orcidid></addata></record> |
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subjects | Applied physics Ferroelectric materials Ferroelectricity Hafnium oxide Lanthanum Oxygen Power consumption Properties (attributes) Vacancies |
title | Impact of oxygen vacancy on the ferroelectric properties of lanthanum-doped hafnium oxide |
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