Lithium electrodeposited on lithiophilic LTO/Ti3C2 substrate as a dendrite-free lithium metal anode

Li metal anodes, which possess ultrahigh theoretical capacity, are considered the ultimate solution for high energy density batteries. However, issues regarding safety and rapid electrode degradation due to Li dendrite growth have restricted the commercialization of Li metal anodes for several decad...

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Veröffentlicht in:Journal of materials chemistry. A, Materials for energy and sustainability Materials for energy and sustainability, 2020-01, Vol.8 (39), p.20650-20657
Hauptverfasser: Gan, Ruiyi, Liu, Yiling, Yang, Na, Cheng, Tong, Deng, Mingming, Qin Dong, Tang, Xianyi, Fu, Na, Li, Cunpu, Wei, Zidong
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Sprache:eng
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Zusammenfassung:Li metal anodes, which possess ultrahigh theoretical capacity, are considered the ultimate solution for high energy density batteries. However, issues regarding safety and rapid electrode degradation due to Li dendrite growth have restricted the commercialization of Li metal anodes for several decades. Herein, a stable, dendrite-free Li metal anode with a hairy-layered architecture is reported, which is realized though a facile electrochemical deposition of Li on a lithiophilic LTO/Ti3C2 composite. The simultaneous formation of the lithiophilic composite could induce the uniform deposition of Li ions and acted as an interlayer skeleton for the intercalation of Li ions. A microscale uniform electric field could also be formed to regulate the Li-ion deposition behaviour. Thus, the growth of dendrites could be inhibited, the formation of dead Li could be prevented, and a stable, long-life Li metal anode could be realized. The obtained Li/LTO/Ti3C2/Cu electrode could reversibly charge/discharge for 2000 h with a high current of 1 mA cm−2 and an ultralow voltage hysteresis of 20 mV. Full batteries with the Li/LTO/Ti3C2/Cu anode exhibit excellent electrochemical performance. This work provides a promising anode design strategy for the fabrication of high-performance and safe Li metal batteries.
ISSN:2050-7488
2050-7496
DOI:10.1039/d0ta07552c