A Kinetic Monte Carlo Study of Retention Time in a POM Molecule-Based Flash Memory

The modelling of conventional and novel memory devices has gained significant traction in recent years. This is primarily because the need to store an increasingly larger amount of data demands a better understanding of the working of the novel memory devices, to enable faster development of the fut...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:IEEE transactions on nanotechnology 2020, Vol.19, p.704-710
Hauptverfasser: Badami, Oves, Sadi, Toufik, Adamu-Lema, Fikru, Lapham, Paul, Mu, Dejiang, Georgiev, Vihar, Ding, Jie, Asenov, Asen
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The modelling of conventional and novel memory devices has gained significant traction in recent years. This is primarily because the need to store an increasingly larger amount of data demands a better understanding of the working of the novel memory devices, to enable faster development of the future technology generations. Furthermore, in-memory computing is also of great interest from the computational perspectives, to overcome the data transfer bottleneck that is prevalent in the von-Neumann architecture. These important factors necessitate the development of comprehensive TCAD simulation tools that can be used for modeling carrier dynamics in the gate oxides of the flash memory cells. In this work, we introduce the kinetic Monte Carlo module that we have developed and integrated within the Nano Electronic Simulation Software (NESS) - to model electronic charge transport in Flash memory type structures. Using the developed module, we perform retention time analysis for a polyoxometalate (POM) molecule-based charge trap flash memory. Our simulation study highlights that retention characteristics for the POM molecules have a unique feature that depends on the properties of the tunneling oxide.
ISSN:1536-125X
1941-0085
DOI:10.1109/TNANO.2020.3016182