P‐57: Preparation of Patternable High Resolution and High Refractive Index Materials for AR/VR

P‐57: Preparation of Patternable High Resolution and High Refractive Index Materials for AR/VR

The patternable materials have been improved to be high transparency, high resolution, and adaptable for patterning with photolithography, ink‐jet print and imprint. Moreover, combination of high refractive index materials and the patternable technologies led to wider applications for next generatio...

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Veröffentlicht in:SID International Symposium Digest of technical papers 2020-08, Vol.51 (1), p.1555-1557
Hauptverfasser: Hikida, Jiro, Chisaka, Hiroki, Ijima, Yoichiro, Liao, Yuehchun, Konno, Kenri, Hirano, Isao, Misumi, Kouichi, Shiota, Dai, Ohmori, Katsumi
Format: Artikel
Sprache:eng
Schlagworte:
High refractive index material (HRI)
High resolution
Imprint lithography
Inkjet print
Photolithography
Photo‐lithography
Refractivity
Titania (TiO2)
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Beschreibung
Zusammenfassung:The patternable materials have been improved to be high transparency, high resolution, and adaptable for patterning with photolithography, ink‐jet print and imprint. Moreover, combination of high refractive index materials and the patternable technologies led to wider applications for next generation of display industry, such as AR/VR and smart glasses.
ISSN:0097-966X
2168-0159
DOI:10.1002/sdtp.14187