GaPAsN-based light-emitting diode on silicon

•A light-emitting diode based on diluted nitrides on a silicon substrate has been created.•The main most important stages of the formation of a light-emitting diode on a silicon substrate are shown.•The LED shows excellent thermal stability of radiation in the range of 200–360 K.•The LED has a high...

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Veröffentlicht in:Optics and laser technology 2020-09, Vol.129, p.106308, Article 106308
Hauptverfasser: Lazarenko, Alexandra A., Nikitina, Ekaterina V., Gudovskikh, Alexander S., Baranov, Artem I., Sobolev, Maxim S., Pirogov, Evgeny V., Egorov, Anton Yu
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Sprache:eng
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Zusammenfassung:•A light-emitting diode based on diluted nitrides on a silicon substrate has been created.•The main most important stages of the formation of a light-emitting diode on a silicon substrate are shown.•The LED shows excellent thermal stability of radiation in the range of 200–360 K.•The LED has a high breakdown voltage of ~40 V. This paper describes the design and the stages of development of a light-emitting diode (LED) based on dilute nitride semiconductors on a silicon substrate. Current-voltage characteristics and electroluminescence spectra were obtained for the LED structure. The LED demonstrates intensive electroluminescence at a wavelength of 645 nm up to the temperature of 360 K. Besides, the resulting LED structure has a good temperature stability of the emission wavelength and a high breakdown voltage of ~−40 V.
ISSN:0030-3992
1879-2545
DOI:10.1016/j.optlastec.2020.106308