High‐Resolution Nanopatterning: Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography (Adv. Mater. 35/2020)

High‐Resolution Nanopatterning: Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography (Adv. Mater. 35/2020)

In article number 1907101, Hwan‐Jin Jeon, Hee‐Tae Jung, and co‐workers review recent progress in simple and cost‐effective top‐down lithography methods for ≈10 nm scale nanopatterns via edge and secondary sputtering techniques, demonstrating the principles, technical advances, and application....

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Veröffentlicht in:Advanced materials (Weinheim) 2020-09, Vol.32 (35), p.n/a
Hauptverfasser: Jung, Woo‐Bin, Jang, Sungwoo, Cho, Soo‐Yeon, Jeon, Hwan‐Jin, Jung, Hee‐Tae
Format: Artikel
Sprache:eng
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high‐aspect‐ratio nanopatterning
high‐resolution nanopatterning
Lithography
Materials science
secondary sputtering lithography
Sputtering
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container_issue 35
container_start_page
container_title Advanced materials (Weinheim)
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creator Jung, Woo‐Bin
Jang, Sungwoo
Cho, Soo‐Yeon
Jeon, Hwan‐Jin
Jung, Hee‐Tae
description In article number 1907101, Hwan‐Jin Jeon, Hee‐Tae Jung, and co‐workers review recent progress in simple and cost‐effective top‐down lithography methods for ≈10 nm scale nanopatterns via edge and secondary sputtering techniques, demonstrating the principles, technical advances, and application.
doi_str_mv 10.1002/adma.202070263
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_2438870090</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2438870090</sourcerecordid><originalsourceid>FETCH-LOGICAL-c2023-f068f34aecb67d269866a864fb2b2f04ceced769c1530b655b9d4d068e0e61eb3</originalsourceid><addsrcrecordid>eNqFkTtv2zAURomiAeomXTtfoEs7SLmiJFrKZjhOU8BJizidBYoPm4FFqqScwFvGZsvP65xfEhou2mbqRBA8h_fxEfI-wzRDpMdcdjylSHGMlOWvyCgraZYUWJevyQjrvExqVlRvyNsQbhCxZshG5Ne5Wa6e7h-vVHDrzWCchUtuXc-HQXlr7PIErpRQdoBv3i29CgGMhYXp-rUCbiVMXRiiP9NaicHcKrh2fbyfujsLczOsosT71Ra08_D08DNDsB0sBI_6P4XCCZx518FMLtULbXCwUMJZyf0WFv1mR8euXjAfJ_I2hQsen1LIy-PdDj4dkQPN10G9-30eku9ns-vpeTL_-vnLdDJPRMTyRCOrdF5wJVo2lpTVFWO8YoVuaUs1FiIOL8esFlmZY8vKsq1lIaOkULFMtfkh-bD_t_fux0aFoblxG29jyYYWeVWN46YxUumeEt6F4JVuem-6OFOTYbNLr9ml1_xJLwr1Xrgza7X9D91MTi8mf91n2y2kXA</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2438870090</pqid></control><display><type>article</type><title>High‐Resolution Nanopatterning: Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography (Adv. Mater. 35/2020)</title><source>Wiley Online Library Journals Frontfile Complete</source><creator>Jung, Woo‐Bin ; Jang, Sungwoo ; Cho, Soo‐Yeon ; Jeon, Hwan‐Jin ; Jung, Hee‐Tae</creator><creatorcontrib>Jung, Woo‐Bin ; Jang, Sungwoo ; Cho, Soo‐Yeon ; Jeon, Hwan‐Jin ; Jung, Hee‐Tae</creatorcontrib><description>In article number 1907101, Hwan‐Jin Jeon, Hee‐Tae Jung, and co‐workers review recent progress in simple and cost‐effective top‐down lithography methods for ≈10 nm scale nanopatterns via edge and secondary sputtering techniques, demonstrating the principles, technical advances, and application.</description><identifier>ISSN: 0935-9648</identifier><identifier>EISSN: 1521-4095</identifier><identifier>DOI: 10.1002/adma.202070263</identifier><language>eng</language><publisher>Weinheim: Wiley Subscription Services, Inc</publisher><subject>high‐aspect‐ratio nanopatterning ; high‐resolution nanopatterning ; Lithography ; Materials science ; secondary sputtering lithography ; Sputtering</subject><ispartof>Advanced materials (Weinheim), 2020-09, Vol.32 (35), p.n/a</ispartof><rights>2020 Wiley‐VCH GmbH</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c2023-f068f34aecb67d269866a864fb2b2f04ceced769c1530b655b9d4d068e0e61eb3</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1002%2Fadma.202070263$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1002%2Fadma.202070263$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,780,784,1417,27924,27925,45574,45575</link.rule.ids></links><search><creatorcontrib>Jung, Woo‐Bin</creatorcontrib><creatorcontrib>Jang, Sungwoo</creatorcontrib><creatorcontrib>Cho, Soo‐Yeon</creatorcontrib><creatorcontrib>Jeon, Hwan‐Jin</creatorcontrib><creatorcontrib>Jung, Hee‐Tae</creatorcontrib><title>High‐Resolution Nanopatterning: Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography (Adv. Mater. 35/2020)</title><title>Advanced materials (Weinheim)</title><description>In article number 1907101, Hwan‐Jin Jeon, Hee‐Tae Jung, and co‐workers review recent progress in simple and cost‐effective top‐down lithography methods for ≈10 nm scale nanopatterns via edge and secondary sputtering techniques, demonstrating the principles, technical advances, and application.</description><subject>high‐aspect‐ratio nanopatterning</subject><subject>high‐resolution nanopatterning</subject><subject>Lithography</subject><subject>Materials science</subject><subject>secondary sputtering lithography</subject><subject>Sputtering</subject><issn>0935-9648</issn><issn>1521-4095</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><recordid>eNqFkTtv2zAURomiAeomXTtfoEs7SLmiJFrKZjhOU8BJizidBYoPm4FFqqScwFvGZsvP65xfEhou2mbqRBA8h_fxEfI-wzRDpMdcdjylSHGMlOWvyCgraZYUWJevyQjrvExqVlRvyNsQbhCxZshG5Ne5Wa6e7h-vVHDrzWCchUtuXc-HQXlr7PIErpRQdoBv3i29CgGMhYXp-rUCbiVMXRiiP9NaicHcKrh2fbyfujsLczOsosT71Ra08_D08DNDsB0sBI_6P4XCCZx518FMLtULbXCwUMJZyf0WFv1mR8euXjAfJ_I2hQsen1LIy-PdDj4dkQPN10G9-30eku9ns-vpeTL_-vnLdDJPRMTyRCOrdF5wJVo2lpTVFWO8YoVuaUs1FiIOL8esFlmZY8vKsq1lIaOkULFMtfkh-bD_t_fux0aFoblxG29jyYYWeVWN46YxUumeEt6F4JVuem-6OFOTYbNLr9ml1_xJLwr1Xrgza7X9D91MTi8mf91n2y2kXA</recordid><startdate>20200901</startdate><enddate>20200901</enddate><creator>Jung, Woo‐Bin</creator><creator>Jang, Sungwoo</creator><creator>Cho, Soo‐Yeon</creator><creator>Jeon, Hwan‐Jin</creator><creator>Jung, Hee‐Tae</creator><general>Wiley Subscription Services, Inc</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20200901</creationdate><title>High‐Resolution Nanopatterning: Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography (Adv. Mater. 35/2020)</title><author>Jung, Woo‐Bin ; Jang, Sungwoo ; Cho, Soo‐Yeon ; Jeon, Hwan‐Jin ; Jung, Hee‐Tae</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c2023-f068f34aecb67d269866a864fb2b2f04ceced769c1530b655b9d4d068e0e61eb3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2020</creationdate><topic>high‐aspect‐ratio nanopatterning</topic><topic>high‐resolution nanopatterning</topic><topic>Lithography</topic><topic>Materials science</topic><topic>secondary sputtering lithography</topic><topic>Sputtering</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Jung, Woo‐Bin</creatorcontrib><creatorcontrib>Jang, Sungwoo</creatorcontrib><creatorcontrib>Cho, Soo‐Yeon</creatorcontrib><creatorcontrib>Jeon, Hwan‐Jin</creatorcontrib><creatorcontrib>Jung, Hee‐Tae</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Advanced materials (Weinheim)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Jung, Woo‐Bin</au><au>Jang, Sungwoo</au><au>Cho, Soo‐Yeon</au><au>Jeon, Hwan‐Jin</au><au>Jung, Hee‐Tae</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>High‐Resolution Nanopatterning: Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography (Adv. Mater. 35/2020)</atitle><jtitle>Advanced materials (Weinheim)</jtitle><date>2020-09-01</date><risdate>2020</risdate><volume>32</volume><issue>35</issue><epage>n/a</epage><issn>0935-9648</issn><eissn>1521-4095</eissn><abstract>In article number 1907101, Hwan‐Jin Jeon, Hee‐Tae Jung, and co‐workers review recent progress in simple and cost‐effective top‐down lithography methods for ≈10 nm scale nanopatterns via edge and secondary sputtering techniques, demonstrating the principles, technical advances, and application.</abstract><cop>Weinheim</cop><pub>Wiley Subscription Services, Inc</pub><doi>10.1002/adma.202070263</doi><tpages>1</tpages><oa>free_for_read</oa></addata></record>
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subjects high‐aspect‐ratio nanopatterning
high‐resolution nanopatterning
Lithography
Materials science
secondary sputtering lithography
Sputtering
title High‐Resolution Nanopatterning: Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography (Adv. Mater. 35/2020)
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-05T20%3A55%3A02IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=High%E2%80%90Resolution%20Nanopatterning:%20Recent%20Progress%20in%20Simple%20and%20Cost%E2%80%90Effective%20Top%E2%80%90Down%20Lithography%20for%20%E2%89%8810%20nm%20Scale%20Nanopatterns:%20From%20Edge%20Lithography%20to%20Secondary%20Sputtering%20Lithography%20(Adv.%20Mater.%2035/2020)&rft.jtitle=Advanced%20materials%20(Weinheim)&rft.au=Jung,%20Woo%E2%80%90Bin&rft.date=2020-09-01&rft.volume=32&rft.issue=35&rft.epage=n/a&rft.issn=0935-9648&rft.eissn=1521-4095&rft_id=info:doi/10.1002/adma.202070263&rft_dat=%3Cproquest_cross%3E2438870090%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=2438870090&rft_id=info:pmid/&rfr_iscdi=true