High‐Resolution Nanopatterning: Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography (Adv. Mater. 35/2020)

High‐Resolution Nanopatterning: Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography (Adv. Mater. 35/2020)

In article number 1907101, Hwan‐Jin Jeon, Hee‐Tae Jung, and co‐workers review recent progress in simple and cost‐effective top‐down lithography methods for ≈10 nm scale nanopatterns via edge and secondary sputtering techniques, demonstrating the principles, technical advances, and application....

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Veröffentlicht in:Advanced materials (Weinheim) 2020-09, Vol.32 (35), p.n/a
Hauptverfasser: Jung, Woo‐Bin, Jang, Sungwoo, Cho, Soo‐Yeon, Jeon, Hwan‐Jin, Jung, Hee‐Tae
Format: Artikel
Sprache:eng
Schlagworte:
high‐aspect‐ratio nanopatterning
high‐resolution nanopatterning
Lithography
Materials science
secondary sputtering lithography
Sputtering
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Zusammenfassung:In article number 1907101, Hwan‐Jin Jeon, Hee‐Tae Jung, and co‐workers review recent progress in simple and cost‐effective top‐down lithography methods for ≈10 nm scale nanopatterns via edge and secondary sputtering techniques, demonstrating the principles, technical advances, and application.
ISSN:0935-9648
1521-4095
DOI:10.1002/adma.202070263