Constructing NiFe-LDH wrapped Cu2O nanocube heterostructure photocatalysts for enhanced photocatalytic dye degradation and CO2 reduction via Z-scheme mechanism
Considering the flexible chemical composition, tunable electronic properties and unique two-dimensional structure of layered double hydroxides (LDHs), we constructed NiFe-LDH/Cu2O heterostructure photocatalysts. The photocatalytic performance of NiFe-LDH/Cu2O heterostructure photocatalysts was evalu...
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Veröffentlicht in: | Journal of alloys and compounds 2020-08, Vol.831, p.154723, Article 154723 |
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Sprache: | eng |
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Zusammenfassung: | Considering the flexible chemical composition, tunable electronic properties and unique two-dimensional structure of layered double hydroxides (LDHs), we constructed NiFe-LDH/Cu2O heterostructure photocatalysts. The photocatalytic performance of NiFe-LDH/Cu2O heterostructure photocatalysts was evaluated by methyl blue (MB) degradation and CO2 reduction under visible-light illumination. The removal efficiency of MB was improved from 20% for Cu2O and 45% for NiFe-LDH to 93% for NiFe-LDH/Cu2O after 30 min adsorption and 240 min visible-light irradiation. Moreover, CH4 yield from CO2 reduction over NiFe-LDH/Cu2O is about 5.6 and 6.9 times that of NiFe-LDH and Cu2O, respectively. Based on a detailed study of structural, electronic, optical and electrochemical properties, Z-scheme photocatalytic mechanism was proposed to explain the enhanced photocatalytic performance of NiFe-LDH/Cu2O. This work presents an inexpensive and flexible strategy for manufacturing heterostructure photocatalysts using earth-abundant elements.
•NiFe-LDH/Cu2O heterostructure photocatalysts were successfully prepared by a co-precipitation method.•MB removal efficiency can be improved from 20% for Cu2O and 45% for NiFe-LDH to 93% for NiFe/Cu2O。.•CH4 yield from CO2 photoreduction over NiFe-LDH/Cu2O is 5.6 and 6.9 times of NiFe-LDH and Cu2O, respectively.•Z-scheme mechanism is proposed, which is responsible for promoted charge separation and higher redox potentials. |
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ISSN: | 0925-8388 1873-4669 |
DOI: | 10.1016/j.jallcom.2020.154723 |