Ultra-thin N-doped-graphene encapsulated Ni nanoparticles coupled with MoO2 nanosheets for highly efficient water splitting at large current density
An efficient non-noble metal-based bifunctional catalyst with ultrahigh performance at large current density is imperative for industrial electrochemical water splitting. Herein, ultra-thin N-doped-graphene encapsulated Ni nanoparticles coupled with MoO2 nanosheets self-supported on 3D nickel foam a...
Gespeichert in:
Veröffentlicht in: | Journal of materials chemistry. A, Materials for energy and sustainability Materials for energy and sustainability, 2020-01, Vol.8 (29), p.14545-14554 |
---|---|
Hauptverfasser: | , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | An efficient non-noble metal-based bifunctional catalyst with ultrahigh performance at large current density is imperative for industrial electrochemical water splitting. Herein, ultra-thin N-doped-graphene encapsulated Ni nanoparticles coupled with MoO2 nanosheets self-supported on 3D nickel foam are synthesized by a hydrothermal method and post-treatment at high temperature. The experimental results and theoretical calculations confirm the electron transfer from Ni to N-doped-graphene at the interface, which can boost the hydrogen evolution reaction (HER) and oxygen evolution reaction (OER) performance. It displays Pt-like HER activity, can reach −10 mA cm−2 with a lower overpotential of 25 mV, and hold at −400 and −1000 mA cm−2 for 172 h without decline in performance. Meanwhile, it also exhibits good OER performance at large current density and can work for 196 h at 1000 mA cm−2 without attenuation as the cathode and anode, suggesting superior durability. This work indicates that the interface engineering of the N-doped-graphene encapsulated structure is beneficial to overall water splitting and offers a promising method for future hydrogen production. |
---|---|
ISSN: | 2050-7488 2050-7496 |
DOI: | 10.1039/d0ta04388e |