A preliminary investigation into the use of molecular oxide and hydride secondary ion relationships for improvement of the 236U/238U determination on a NanoSIMS 50L

A NanoSIMS 50L is used to investigate uranium molecular ( 235 U 16 O, 236 U 16 O, 238 U 16 O, 235 U 1 H, 238 U 1 H, 236 U 16 O 1 H, and 238 U 16 O 1 H) and elemental ( 235 U, 236 U, and 238 U) secondary ion production during sputtering of synthetic UO 2 and the NIST-610 standard to determine if: (1)...

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Veröffentlicht in:Scientific reports 2020-07, Vol.10 (1), p.12285-12285, Article 12285
Hauptverfasser: Zirakparvar, N. Alex, Hexel, Cole R., Smith, Julie B., Miskowiec, Andrew J., Spano, Tyler L., Kapsimalis, Roger
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Sprache:eng
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Zusammenfassung:A NanoSIMS 50L is used to investigate uranium molecular ( 235 U 16 O, 236 U 16 O, 238 U 16 O, 235 U 1 H, 238 U 1 H, 236 U 16 O 1 H, and 238 U 16 O 1 H) and elemental ( 235 U, 236 U, and 238 U) secondary ion production during sputtering of synthetic UO 2 and the NIST-610 standard to determine if: (1) the 236 U 16 O/ 238 U 16 O molecular oxide ratio performs better than the 236 U/ 238 U elemental ratio, and (2) there is co-variance between the molecular hydrides and oxides. Despite an order of magnitude greater abundance of 236 U 16 O secondary ions (compared to 236 U), the 236 U 16 O/ 238 U 16 O ratios are less accurate than the 236 U/ 238 U ratios. Further work is needed before the higher count rate of the 236 U 16 O secondary ion can be used to obtain a better 236 U/ 238 U ratio. The second objective was undertaken because correction for the interference of 235 U 1 H on the 236 U secondary ion species typically utilizes the 238 U 1 H/ 238 U ratio. This becomes problematic in samples containing 239 Pu, so our aim was to understand if the hydride formation rate can be constrained independently of having to measure the 238 U 1 H. We document correlations between the hydride ( 238 U 1 H and 238 U 16 O 1 H) and oxide ( 236 U 16 O) secondary ions, suggesting that pursuing an alternative correction regime is worthwhile.
ISSN:2045-2322
2045-2322
DOI:10.1038/s41598-020-69121-9