The Effect of Surface Polarity on the CMP Behavior of 6H-SiC Substrates

The chemical mechanical planarization (CMP) performance of the Si-face and C-face 6H-SiC substrates were compared using potassium permanganate (KMnO 4 ) as an oxidizer and the alumina (Al 2 O 3 ) nanoparticles as the abrasive particles over a pH range from 2 to 10. The results indicate that there was a significant difference in the CMP performance between Si-face and C-face 6H-SiC substrates, indicating that the CMP process was sensitive to the surface polarity of the 6H-SiC substrates. A higher material removal rate (MRR) was obtained during the CMP of C-face 6H-SiC substrates, as compared to that of Si-face 6H-SiC substrates. The maximum MRR of the C-face 6H-SiC substrates was reached to 6412 nm/h with an average surface roughness Ra of 0.54 nm when using the slurries containing 2 wt% alumina nanoparticles, 0.05 M KMnO 4 at pH 2. While the Si-face 6H-SiC substrates was 1554 nm/h with an average surface roughness Ra of 0.53 nm. Furthermore, the polishing mechanism was also discussed based on the MRR, atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) analysis of the dipped and polished 6H-SiC surfaces.