Effects of Sputtering Time on Structure and Mechanical Properties of (AlCrNbSiTiV)N Coatings Deposited by High-Power Impulse Magnetron Cosputtering

The effect of the sputtering time on the microstructure and mechanical properties of (AlCrNbSiTiV)N coatings deposited using high-power impulse magnetron sputtering (HiPIMS) and cosputtering with (AlCrNbSiTiV) equimolar and Ti targets has been studied. The surface morphology of the (AlCrNbSiTiV)N coatings was uniform and dense, with no peel-off or microcracks, and the films demonstrated complete attachment to the substrate. The (AlCrNbSiTiV)N films had a single face-centered cubic phase. An increase in the sputtering time resulted in the deposition of larger grains on the surface of the film. The greatest (N 2 ) and lowest (Al) concentration varied slightly for the (AlCrNbSiTiV)N films. The elements in the (AlCrNbSiTiV)N film exhibited homogeneous distributions throughout the depth, as measured by secondary-ion mass spectroscopy. The experimental results also revealed that a cutting tool coated with the film using a sputtering time of 30 min exhibited the minimum flank wear (11.7 μ m) and surface roughness ( R a = 1.018 μ m). Cutting tools coated with (AlCrNbSiTiV)N film for turning Ti-6Al-4V alloys will achieve better cutting quality and have a longer tool life.