Absorption enhancement by surface texturing in ZnO/Si heterojunction

In this paper, thin film of ZnO nanoparticles deposited on a planar Si (100) and a textured Si (100) substrate are investigated. Chemical etching is used to prepare textured Si substrate and RF magnetron sputtering is used to deposite ZnO thin films. The surface morphology and reflectance are studied with SEM and UV-VIS Spectroscopy, respectively. Structural morphology of the etched wafer indicate random pyramidal structures. Optical study indicates a significant reduction in reflectance for textured silicon (TS) heterojunction in comparison to planar Si (PS) heterojunction. This study promotes the study of heterojunction devices and surface texturing for light management in various optoelectronic devices.