Chemical state, structure and mechanical properties of multi-element (CrTaNbMoV)Nx films by reactive magnetron sputtering

Multi-element CrTaNbMoV nitride films are prepared using direct current magnetron sputtering CrTaNbMoV mosaic alloy target at various N2/(Ar + N2) flow ratios (RN). The influence of RN on the composition, structure, mechanical properties and wear behavior of the films deposited at RN = 0%, 10%, 20%, 30% and 40% are investigated. The alloy CrTaNbMoV film exhibits a simple BCC structure, while a nanocrystalline BCC structure of metals and metal nitrides is observed in the nitride films deposited at RN = 10%. With further increasing RN from 20% to 40%, the structure evolves from BCC to FCC. The nitride film deposited at RN = 20% exhibits the highest hardness and adhesive critical load (Lc), which are 21.6 GPa and 331 mN, respectively. The wear rate of film deposited at RN = 20% is decreased six times than the alloy film (RN = 0%), indicated an excellent wear resistance. [Display omitted] •CrTaNbMoV nitride films were deposited by sputtering mosaic alloy target.•The structure of nitride films was evolved from BCC to FCC with increasing RN [N2/(N2+Ar)].•Maximum hardness and adhesive load of nitride film reached 21.6 GPa and 331 mN, respectively.•CrTaNbMoV nitride films exhibited superior wear resistance.