Formation of a Nickel–Aluminum Intermetallic during Ion-Beam Mixing

The results of studying the X-ray photoelectron spectroscopy of the chemical composition of nickel surface layers with a deposited aluminum film, depending on the dose of irradiation with argon ions, are presented. Analysis of the spectra shows the formation of Ni 3 Al aluminide during ion-beam mixi...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Surface investigation, x-ray, synchrotron and neutron techniques x-ray, synchrotron and neutron techniques, 2019-11, Vol.13 (6), p.1225-1229
Hauptverfasser:	Vorob’ev, V. L., Klimova, I. N., Kolotov, A. A., Bykov, P. V., Bayankin, V. Ya
Format:	Artikel
Sprache:	eng
Schlagworte:	Aluminum Argon Argon ions Chemical composition Chemistry and Materials Science Implantation Ion beams Materials Science Nickel aluminides Organic chemistry Photoelectrons Radiation dosage Spectrum analysis Surface layers Surfaces and Interfaces Thin Films
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The results of studying the X-ray photoelectron spectroscopy of the chemical composition of nickel surface layers with a deposited aluminum film, depending on the dose of irradiation with argon ions, are presented. Analysis of the spectra shows the formation of Ni 3 Al aluminide during ion-beam mixing. The highest content (~20%) of this compound in the modified layer is observed at an implantation dose of 5 × 10 16 cm –2 .
ISSN:	1027-4510 1819-7094
DOI:	10.1134/S1027451019060569