Synthesis of Photosensitive Cyclopropane-Containing Polymers
New cyclopropyl methacrylate monomers were prepared, their radical polymerization was performed, and the composition and structure of the polymers obtained, containing reactive UV-sensitive fragments, were determined. Experiments on photochemical cross-linking revealed photosensitivity of the polyme...
Gespeichert in:
| Veröffentlicht in: | Russian journal of applied chemistry 2019-09, Vol.92 (9), p.1215-1222 |
|---|---|
| Hauptverfasser: | , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | 1222 |
|---|---|
| container_issue | 9 |
| container_start_page | 1215 |
| container_title | Russian journal of applied chemistry |
| container_volume | 92 |
| creator | Guliyev, K. G. Rzayeva, A. E. Guliyev, A. M. |
| description | New cyclopropyl methacrylate monomers were prepared, their radical polymerization was performed, and the composition and structure of the polymers obtained, containing reactive UV-sensitive fragments, were determined. Experiments on photochemical cross-linking revealed photosensitivity of the polymers synthesized. The materials based on them are optically transparent and can be used in microelectronics and optics. |
| doi_str_mv | 10.1134/S1070427219090052 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_2308643377</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2308643377</sourcerecordid><originalsourceid>FETCH-LOGICAL-c353t-b67bde36b285f4d7e124ee8a53f90c7e74021dae3455c5f553f7a5a67b3c3ff3</originalsourceid><addsrcrecordid>eNp1kE1Lw0AQhhdRsFZ_gLeA5-jsdwJeJPgFBQvtPWyT2TYl3a27qZB_75YKHsTTDPO-z8zwEnJL4Z5SLh4WFDQIphktoQSQ7IxMqIIi56xU56lPcn7UL8lVjFsAKJUqJuRxMbphg7GLmbfZfOMHH9HFbui-MKvGpvf74PfGYV55N5jOdW6dzX0_7jDEa3JhTR_x5qdOyfLleVm95bOP1_fqaZY3XPIhXym9apGrFSukFa1GygRiYSS3JTQatQBGW4NcSNlIK9NcG2kSxRtuLZ-Su9Pa9MrnAeNQb_0huHSxZhwKJTjXOrnoydUEH2NAW-9DtzNhrCnUx4zqPxklhp2YmLxujeF38__QN1bkaKI</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2308643377</pqid></control><display><type>article</type><title>Synthesis of Photosensitive Cyclopropane-Containing Polymers</title><source>SpringerLink Journals</source><creator>Guliyev, K. G. ; Rzayeva, A. E. ; Guliyev, A. M.</creator><creatorcontrib>Guliyev, K. G. ; Rzayeva, A. E. ; Guliyev, A. M.</creatorcontrib><description>New cyclopropyl methacrylate monomers were prepared, their radical polymerization was performed, and the composition and structure of the polymers obtained, containing reactive UV-sensitive fragments, were determined. Experiments on photochemical cross-linking revealed photosensitivity of the polymers synthesized. The materials based on them are optically transparent and can be used in microelectronics and optics.</description><identifier>ISSN: 1070-4272</identifier><identifier>EISSN: 1608-3296</identifier><identifier>DOI: 10.1134/S1070427219090052</identifier><language>eng</language><publisher>Moscow: Pleiades Publishing</publisher><subject>Chemical synthesis ; Chemistry ; Chemistry and Materials Science ; Chemistry/Food Science ; Crosslinking ; Cyclopropane ; Industrial Chemistry/Chemical Engineering ; Macromolecular Compounds and Polymeric Materials ; Organic compounds ; Photosensitivity ; Polymers</subject><ispartof>Russian journal of applied chemistry, 2019-09, Vol.92 (9), p.1215-1222</ispartof><rights>Pleiades Publishing, Ltd. 2019</rights><rights>Copyright Springer Nature B.V. 2019</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c353t-b67bde36b285f4d7e124ee8a53f90c7e74021dae3455c5f553f7a5a67b3c3ff3</citedby><cites>FETCH-LOGICAL-c353t-b67bde36b285f4d7e124ee8a53f90c7e74021dae3455c5f553f7a5a67b3c3ff3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1134/S1070427219090052$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1134/S1070427219090052$$EHTML$$P50$$Gspringer$$H</linktohtml><link.rule.ids>314,780,784,27924,27925,41488,42557,51319</link.rule.ids></links><search><creatorcontrib>Guliyev, K. G.</creatorcontrib><creatorcontrib>Rzayeva, A. E.</creatorcontrib><creatorcontrib>Guliyev, A. M.</creatorcontrib><title>Synthesis of Photosensitive Cyclopropane-Containing Polymers</title><title>Russian journal of applied chemistry</title><addtitle>Russ J Appl Chem</addtitle><description>New cyclopropyl methacrylate monomers were prepared, their radical polymerization was performed, and the composition and structure of the polymers obtained, containing reactive UV-sensitive fragments, were determined. Experiments on photochemical cross-linking revealed photosensitivity of the polymers synthesized. The materials based on them are optically transparent and can be used in microelectronics and optics.</description><subject>Chemical synthesis</subject><subject>Chemistry</subject><subject>Chemistry and Materials Science</subject><subject>Chemistry/Food Science</subject><subject>Crosslinking</subject><subject>Cyclopropane</subject><subject>Industrial Chemistry/Chemical Engineering</subject><subject>Macromolecular Compounds and Polymeric Materials</subject><subject>Organic compounds</subject><subject>Photosensitivity</subject><subject>Polymers</subject><issn>1070-4272</issn><issn>1608-3296</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2019</creationdate><recordtype>article</recordtype><recordid>eNp1kE1Lw0AQhhdRsFZ_gLeA5-jsdwJeJPgFBQvtPWyT2TYl3a27qZB_75YKHsTTDPO-z8zwEnJL4Z5SLh4WFDQIphktoQSQ7IxMqIIi56xU56lPcn7UL8lVjFsAKJUqJuRxMbphg7GLmbfZfOMHH9HFbui-MKvGpvf74PfGYV55N5jOdW6dzX0_7jDEa3JhTR_x5qdOyfLleVm95bOP1_fqaZY3XPIhXym9apGrFSukFa1GygRiYSS3JTQatQBGW4NcSNlIK9NcG2kSxRtuLZ-Su9Pa9MrnAeNQb_0huHSxZhwKJTjXOrnoydUEH2NAW-9DtzNhrCnUx4zqPxklhp2YmLxujeF38__QN1bkaKI</recordid><startdate>20190901</startdate><enddate>20190901</enddate><creator>Guliyev, K. G.</creator><creator>Rzayeva, A. E.</creator><creator>Guliyev, A. M.</creator><general>Pleiades Publishing</general><general>Springer Nature B.V</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20190901</creationdate><title>Synthesis of Photosensitive Cyclopropane-Containing Polymers</title><author>Guliyev, K. G. ; Rzayeva, A. E. ; Guliyev, A. M.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c353t-b67bde36b285f4d7e124ee8a53f90c7e74021dae3455c5f553f7a5a67b3c3ff3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2019</creationdate><topic>Chemical synthesis</topic><topic>Chemistry</topic><topic>Chemistry and Materials Science</topic><topic>Chemistry/Food Science</topic><topic>Crosslinking</topic><topic>Cyclopropane</topic><topic>Industrial Chemistry/Chemical Engineering</topic><topic>Macromolecular Compounds and Polymeric Materials</topic><topic>Organic compounds</topic><topic>Photosensitivity</topic><topic>Polymers</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Guliyev, K. G.</creatorcontrib><creatorcontrib>Rzayeva, A. E.</creatorcontrib><creatorcontrib>Guliyev, A. M.</creatorcontrib><collection>CrossRef</collection><jtitle>Russian journal of applied chemistry</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Guliyev, K. G.</au><au>Rzayeva, A. E.</au><au>Guliyev, A. M.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Synthesis of Photosensitive Cyclopropane-Containing Polymers</atitle><jtitle>Russian journal of applied chemistry</jtitle><stitle>Russ J Appl Chem</stitle><date>2019-09-01</date><risdate>2019</risdate><volume>92</volume><issue>9</issue><spage>1215</spage><epage>1222</epage><pages>1215-1222</pages><issn>1070-4272</issn><eissn>1608-3296</eissn><abstract>New cyclopropyl methacrylate monomers were prepared, their radical polymerization was performed, and the composition and structure of the polymers obtained, containing reactive UV-sensitive fragments, were determined. Experiments on photochemical cross-linking revealed photosensitivity of the polymers synthesized. The materials based on them are optically transparent and can be used in microelectronics and optics.</abstract><cop>Moscow</cop><pub>Pleiades Publishing</pub><doi>10.1134/S1070427219090052</doi><tpages>8</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 1070-4272 |
| ispartof | Russian journal of applied chemistry, 2019-09, Vol.92 (9), p.1215-1222 |
| issn | 1070-4272 1608-3296 |
| language | eng |
| recordid | cdi_proquest_journals_2308643377 |
| source | SpringerLink Journals |
| subjects | Chemical synthesis Chemistry Chemistry and Materials Science Chemistry/Food Science Crosslinking Cyclopropane Industrial Chemistry/Chemical Engineering Macromolecular Compounds and Polymeric Materials Organic compounds Photosensitivity Polymers |
| title | Synthesis of Photosensitive Cyclopropane-Containing Polymers |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-26T02%3A40%3A08IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Synthesis%20of%20Photosensitive%20Cyclopropane-Containing%20Polymers&rft.jtitle=Russian%20journal%20of%20applied%20chemistry&rft.au=Guliyev,%20K.%20G.&rft.date=2019-09-01&rft.volume=92&rft.issue=9&rft.spage=1215&rft.epage=1222&rft.pages=1215-1222&rft.issn=1070-4272&rft.eissn=1608-3296&rft_id=info:doi/10.1134/S1070427219090052&rft_dat=%3Cproquest_cross%3E2308643377%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=2308643377&rft_id=info:pmid/&rfr_iscdi=true |