Synthesis of Photosensitive Cyclopropane-Containing Polymers

New cyclopropyl methacrylate monomers were prepared, their radical polymerization was performed, and the composition and structure of the polymers obtained, containing reactive UV-sensitive fragments, were determined. Experiments on photochemical cross-linking revealed photosensitivity of the polyme...

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Veröffentlicht in:	Russian journal of applied chemistry 2019-09, Vol.92 (9), p.1215-1222
Hauptverfasser:	Guliyev, K. G., Rzayeva, A. E., Guliyev, A. M.
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical synthesis Chemistry Chemistry and Materials Science Chemistry/Food Science Crosslinking Cyclopropane Industrial Chemistry/Chemical Engineering Macromolecular Compounds and Polymeric Materials Organic compounds Photosensitivity Polymers
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Beschreibung
Zusammenfassung:	New cyclopropyl methacrylate monomers were prepared, their radical polymerization was performed, and the composition and structure of the polymers obtained, containing reactive UV-sensitive fragments, were determined. Experiments on photochemical cross-linking revealed photosensitivity of the polymers synthesized. The materials based on them are optically transparent and can be used in microelectronics and optics.
ISSN:	1070-4272 1608-3296
DOI:	10.1134/S1070427219090052