Microstructure and Young's modulus of ZrN thin film prepared by dual ion beam sputtering deposition

The ZrN film has drawn wide attentions as a protective material due to its attractive properties. In this study, ZrN films having thickness about 45 nm were prepared by dual ion beam sputtering deposition to investigate the influence of assisted ion beam (300 eV/25 mA ~ 800 eV/60 mA) and deposition temperature (unheated ~ 600 °C) on nano-film microstructure, grain size, density, and Young's modulus. A double layer structure, comprising an amorphous layer closed to the substrate and a crystalline layer above the amorphous layer was observed. The amorphous layer thickness decreases with the increase of atom mobility and the decrease of oxygen concentration. The assisted ion beam flux and energy influence the grain size, density, and Young's modulus. A porous structure and rough surface forms under high flux and energy assisted ion beam due to the severe damage and resputtering under high-energy nitrogen ion. Besides this, thickness of the amorphous layer decreases, increasing the grain size, density, and Young modulus due to deposition temperature. The Young's modulus shows some dispersion in the low (111) texture coefficient region indicates excellent linearity with the grain size and density. The Young modulus of nanofilm is strongly influenced by grain size or density. The nanofilm texture shows negligible impact on thin film Youngs Modulus. •ZrN films were successfully prepared by dual ion beam sputtering deposition method.•The overlarge assist ion bombardment destroys the film texture and microstructure.•An amorphous layer formed in the film was affected by the deposition atoms energy.•Young's modulus of the film is dominated by the density and grain size.