A laser-fabricated nanometer-thick carbon film and its strain-engineering for achieving ultrahigh piezoresistive sensitivity

Conventionally, the direct laser writing carbonization (DLWc) technique can only be used for producing porous carbon structures. Herein, by selecting an appropriate substrate, such as fused quartz, with low thermal conductivity and a small thermal expansion coefficient for supporting a carbonizable...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of materials chemistry. C, Materials for optical and electronic devices Materials for optical and electronic devices, 2019, Vol.7 (36), p.11276-11284
Hauptverfasser: Luo, Jiangjiang, Duan, Xiaoshuang, Chen, Zhepeng, Ruan, Xiaojun, Yao, Yanbo, Liu, Tao
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Conventionally, the direct laser writing carbonization (DLWc) technique can only be used for producing porous carbon structures. Herein, by selecting an appropriate substrate, such as fused quartz, with low thermal conductivity and a small thermal expansion coefficient for supporting a carbonizable polymer precursor, we report a new approach that enables the use of DLWc for fabricating dense, uniform and nanometer-thick carbon films from very thin polyimide films. The as-formed ultrathin carbon film on fused quartz could also be transferred to various flexible and stretchable polymer substrates, such as polyimide, polyvinyl alcohol and polydimethylsiloxane. With the newly developed fabrication method, a series of ultrathin carbon films with thicknesses ranging from 8-270 nm were prepared, and their chemical/physical structures, and electrical, optical and piezoresistive performances were comprehensively characterized and evaluated. It was found that the ultrathin carbon films of varying thicknesses prepared via DLWc possessed a large content of nitrogen and oxygen with disordered/defective graphitic structures. Except for the thinnest 8 nm thick carbon film, all the films with thicknesses greater than 22 nm manifested a reasonable electrical conductivity and relatively low piezoresistive sensitivity. To further enhance the piezoresistive sensitivity of the obtained carbon thin films, a strain-engineering treatment was performed to introduce nanocracks into the as-prepared thin film samples. Using this approach, a record-high gauge factor of GF > 450 000 at small strain ( < 1.8%) was achieved for the strain-engineered ultrathin carbon thin films. Due to their ease of fabrication, nanometer thickness, mechanical robustness, patternability, transferability and ultrahigh piezoresistive sensitivity, ultrathin carbon films fabricated via DLWc have useful applications in different areas. With fused quartz to support polyimide, dense and nanometer-thick carbon films were fabricated by direct laser writing carbonization. Strain-engineering induced micro/nanocrack formation imparts such film with record-high piezoresistive sensitivity.
ISSN:2050-7526
2050-7534
DOI:10.1039/c9tc03466h