High-Temperature Interaction in the ZrSi2–ZrSiO4 System and Its Mechanism

High-Temperature Interaction in the ZrSi2–ZrSiO4 System and Its Mechanism

The physicochemical interaction in the ZrSi 2 –ZrSiO 4 system at temperatures higher than 1620°C under the conditions of molecular oxygen deficiency is established and experimentally confirmed. Elemental silicon is reduced simultaneously with the oxidation of zirconium to the thermodynamically stabl...

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Veröffentlicht in:Russian metallurgy Metally 2019-06, Vol.2019 (6), p.640-646
Hauptverfasser: Astapov, A. N., Lifanov, I. P., Prokofiev, M. V.
Format: Artikel
Sprache:eng
Schlagworte:
Chemistry and Materials Science
Hardening and Coating Technologies
High temperature
Materials Science
Metallic Materials
Oxidation
Oxygen
Zirconium dioxide
Zirconium silicate
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Zusammenfassung:The physicochemical interaction in the ZrSi 2 –ZrSiO 4 system at temperatures higher than 1620°C under the conditions of molecular oxygen deficiency is established and experimentally confirmed. Elemental silicon is reduced simultaneously with the oxidation of zirconium to the thermodynamically stable ZrO 2 phase. The mechanism and steps of the interaction processes are proposed.
ISSN:0036-0295
1555-6255
1531-8648
DOI:10.1134/S0036029519060065