Photolysis of chlorpyrifos‐methyl, chlorpyrifos‐methyl oxon, and 3,5,6‐trichloro‐2‐pyridinol
The photodegradation of chlorpyrifos‐methyl (1), and two of its photodegradation products, chlorpyrifos‐methyl oxon (2), and 3,5,6‐trichloro‐2‐pyridinol (3) was studied using low pressure Hg lamps irradiating at 254 nm either in pure acetonitrile (ACN) or in 10% ACN/H2O. Experiments conducted in pur...
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Veröffentlicht in: | Journal of physical organic chemistry 2019-08, Vol.32 (8), p.n/a |
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Zusammenfassung: | The photodegradation of chlorpyrifos‐methyl (1), and two of its photodegradation products, chlorpyrifos‐methyl oxon (2), and 3,5,6‐trichloro‐2‐pyridinol (3) was studied using low pressure Hg lamps irradiating at 254 nm either in pure acetonitrile (ACN) or in 10% ACN/H2O. Experiments conducted in pure ACN allowed us to identify the photoproducts in the photolysis of 1, 2, and 3 both, in air saturated samples and in the absence of oxygen as analyzed by gas chromatography–mass spectrometry (GC‐MS), high resolution mass spectrometry (HRMS), and phosphorus‐31 nuclear magnetic resonance (31P NMR).
Since 2 and 3 are products in the photodegradation of 1, their degradations in 10% ACN/H2O were independently measured, and it was determined that 1 and 2 degrade at comparable rates. Instead, 3 does not interfere in the measurement since it degrades much faster, and their products do not absorb in the region of 1.
Our results indicate that short wave photolysis could become a plausible detoxification mechanism.
Photodegradation of chlorpyrifos‐methyl (1), and two of its photodegradation products, chlorpyrifos‐methyl oxon (2), and 3,5,6‐trichloro‐2‐pyridinol (3) was studied using low pressure Hg lamps (254 nm) in pure acetonitrile (ACN) and in 10% ACN/H2O. Photoproducts were identified both, in air saturated samples and in the absence of oxygen; degradation rates were independently measured, since 2 and 3 are products in the photodegradation of 1. Our results indicate that short wave photolysis could become a plausible detoxification mechanism. |
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ISSN: | 0894-3230 1099-1395 |
DOI: | 10.1002/poc.3957 |