One Step Fabrication of ZnO Films Using a Modified Gas-assisted Liquid Phase Deposition Process

One Step Fabrication of ZnO Films Using a Modified Gas-assisted Liquid Phase Deposition Process

ZnO films were fabricated on polyether sulfone substrates using gas-assisted liquid phase deposition with ethylene glycol (EG) at 60 °C. Water and NH3 vapors diffused from a water/EG/hexamethylenetetramine solution into a Zn(NO3)2/EG solution. This caused heterogeneous nucleation at the solid-liquid...

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Veröffentlicht in:Chemistry letters 2019-04, Vol.48 (4), p.382-385
Hauptverfasser: Kubota, Yuta, Kishi, Tetsuo, Yano, Tetsuji, Matsushita, Nobuhiro
Format: Artikel
Sprache:eng
Schlagworte:
Ammonia
Ethylene glycol
Hexamethylenetetramine
Light transmittance
Liquid phase deposition
Liquid phases
Liquid-solid interfaces
Nucleation
Substrates
Zinc oxide
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Zusammenfassung:ZnO films were fabricated on polyether sulfone substrates using gas-assisted liquid phase deposition with ethylene glycol (EG) at 60 °C. Water and NH3 vapors diffused from a water/EG/hexamethylenetetramine solution into a Zn(NO3)2/EG solution. This caused heterogeneous nucleation at the solid-liquid interface, which resulted in the formation of ZnO films. The ZnO films had a continuous film structure because of EG adhesion, and they exhibited visible light transmittance greater than 60%.
ISSN:0366-7022
1348-0715
DOI:10.1246/cl.180975