Analysis of the Shape of Cross Sections Developed under Shave-off Condition Sputtering

Shave-off method has been proven its efficacy for highly precise depth profiling in secondary ion mass spectrometry (SIMS) analysis. The unique technique, shave-off method has distinctive cross-sectional shape after scanning compared with raster scan method. We investigated the cross sectional shape...

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Veröffentlicht in:Journal of Surface Analysis 2017, Vol.24(2), pp.164-166
Hauptverfasser: Kang, So-Hee, Fukushima, Miku, Asakura, Hiroyuki, Habib, Ahsan, Kim, Yun, Tomiyasu, Bunbunoshin, Owari, Masanori
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Sprache:eng
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Zusammenfassung:Shave-off method has been proven its efficacy for highly precise depth profiling in secondary ion mass spectrometry (SIMS) analysis. The unique technique, shave-off method has distinctive cross-sectional shape after scanning compared with raster scan method. We investigated the cross sectional shape of three different height tungsten samples using focused ion beam scanning electron microscopes (FIB-SEM) and transmission electron microscope (TEM). Though it is a simple cross-sectional shape, the analysis results enable the investigation of an angle between primary ion beam and sample surface, and sputtering yield.
ISSN:1341-1756
1347-8400
DOI:10.1384/jsa.24.164