Effects of Oxygen Microbubbles on Photoresist Layers under Hot Water Conditions
We need to enhance the removing ability of microbubbles through the clear understanding of the functional mechanisms of microbubbles for the removal of photoresist layers. The purpose of the present study is to clarify the effect of microbubble on the surface of photoresist layers.
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| Veröffentlicht in: | Journal of Photopolymer Science and Technology 2016/06/21, Vol.29(4), pp.643-646 |
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| container_end_page | 646 |
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| container_issue | 4 |
| container_start_page | 643 |
| container_title | Journal of Photopolymer Science and Technology |
| container_volume | 29 |
| creator | Takahashi, Masayoshi Shirai, Yasuyuki Teramoto, Akinobu Takahashi, Tunejirou Tatera, Katsumi Matsuura, Kouhei Horibe, Hideo |
| description | We need to enhance the removing ability of microbubbles through the clear understanding of the functional mechanisms of microbubbles for the removal of photoresist layers. The purpose of the present study is to clarify the effect of microbubble on the surface of photoresist layers. |
| doi_str_mv | 10.2494/photopolymer.29.643 |
| format | Article |
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| ispartof | Journal of Photopolymer Science and Technology, 2016/06/21, Vol.29(4), pp.643-646 |
| issn | 0914-9244 1349-6336 |
| language | eng |
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| subjects | gas-water interface high-dose ion-implantation microbubbles oxygen photoresist Photoresists |
| title | Effects of Oxygen Microbubbles on Photoresist Layers under Hot Water Conditions |
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