Effects of Oxygen Microbubbles on Photoresist Layers under Hot Water Conditions

We need to enhance the removing ability of microbubbles through the clear understanding of the functional mechanisms of microbubbles for the removal of photoresist layers. The purpose of the present study is to clarify the effect of microbubble on the surface of photoresist layers.

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Bibliographische Detailangaben
Veröffentlicht in:	Journal of Photopolymer Science and Technology 2016/06/21, Vol.29(4), pp.643-646
Hauptverfasser:	Takahashi, Masayoshi, Shirai, Yasuyuki, Teramoto, Akinobu, Takahashi, Tunejirou, Tatera, Katsumi, Matsuura, Kouhei, Horibe, Hideo
Format:	Artikel
Sprache:	eng
Schlagworte:	gas-water interface high-dose ion-implantation microbubbles oxygen photoresist Photoresists
Online-Zugang:	Volltext
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Beschreibung
Zusammenfassung:	We need to enhance the removing ability of microbubbles through the clear understanding of the functional mechanisms of microbubbles for the removal of photoresist layers. The purpose of the present study is to clarify the effect of microbubble on the surface of photoresist layers.
ISSN:	0914-9244 1349-6336
DOI:	10.2494/photopolymer.29.643