Formation of Nitrogen Oxides by Nanosecond Pulsed Plasma Discharges in Gas–Liquid Reactors
A gas–liquid-film flow reactor with a nanosecond pulsed power supply was utilized to produce nitrogen oxides from Ar/N 2 mixtures (gas phase) and deionized water (liquid phase). Chemical analysis of the stable products found in both the gas and liquid phases was performed and chemical quenching was...
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| Veröffentlicht in: | Plasma chemistry and plasma processing 2019-05, Vol.39 (3), p.643-666 |
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| creator | Wandell, Robert J. Wang, Huihui Bulusu, Radha K. M. Gallan, Rachel O. Locke, Bruce R. |
| description | A gas–liquid-film flow reactor with a nanosecond pulsed power supply was utilized to produce nitrogen oxides from Ar/N
2
mixtures (gas phase) and deionized water (liquid phase). Chemical analysis of the stable products found in both the gas and liquid phases was performed and chemical quenching was incorporated for the liquid phase samples in order to eliminate post plasma reactions. Significant amounts of NO and NO
2
in the gas phase and
NO
2
-
and
NO
3
-
in the liquid phase were determined using FTIR spectroscopy and ion chromatography, respectively. The production rate of all nitrogen oxides produced increased significantly with N
2
concentration while H
2
O
2
formation decreased slightly. The gas temperature of the plasma was approximately 525 K and was unaffected by N
2
concentration while the electron density ranged from 1 × 10
17
cm
−3
in pure Ar to 5.5 × 10
17
cm
−3
in 28% N
2
. The role of the
·
OH
in the reaction pathway was assessed by adding CO as a gas phase radical scavenger showing that
·
OH
is essential for conversion of the gas phase NO and NO
2
into water soluble
NO
2
-
and
NO
3
-
. Conversely, atomic oxygen originating from water is likely responsible for NO and NO
2
generation. Experiments with N
2
/O
2
/Ar mixtures and air showed a significant increase in NO
2
production caused by the additional generation of reactive oxygen species. An overall energy yield for all nitrogen oxides produced in the most efficient case was 50 eV/molecule. |
| doi_str_mv | 10.1007/s11090-019-09981-w |
| format | Article |
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2
mixtures (gas phase) and deionized water (liquid phase). Chemical analysis of the stable products found in both the gas and liquid phases was performed and chemical quenching was incorporated for the liquid phase samples in order to eliminate post plasma reactions. Significant amounts of NO and NO
2
in the gas phase and
NO
2
-
and
NO
3
-
in the liquid phase were determined using FTIR spectroscopy and ion chromatography, respectively. The production rate of all nitrogen oxides produced increased significantly with N
2
concentration while H
2
O
2
formation decreased slightly. The gas temperature of the plasma was approximately 525 K and was unaffected by N
2
concentration while the electron density ranged from 1 × 10
17
cm
−3
in pure Ar to 5.5 × 10
17
cm
−3
in 28% N
2
. The role of the
·
OH
in the reaction pathway was assessed by adding CO as a gas phase radical scavenger showing that
·
OH
is essential for conversion of the gas phase NO and NO
2
into water soluble
NO
2
-
and
NO
3
-
. Conversely, atomic oxygen originating from water is likely responsible for NO and NO
2
generation. Experiments with N
2
/O
2
/Ar mixtures and air showed a significant increase in NO
2
production caused by the additional generation of reactive oxygen species. An overall energy yield for all nitrogen oxides produced in the most efficient case was 50 eV/molecule.</description><identifier>ISSN: 0272-4324</identifier><identifier>EISSN: 1572-8986</identifier><identifier>DOI: 10.1007/s11090-019-09981-w</identifier><language>eng</language><publisher>New York: Springer US</publisher><subject>Atomic oxygen ; Characterization and Evaluation of Materials ; Chemical analysis ; Chemistry ; Chemistry and Materials Science ; Classical Mechanics ; Deionization ; Electron density ; Fourier transforms ; Gas temperature ; Hydrogen peroxide ; Inorganic Chemistry ; Liquid phases ; Mechanical Engineering ; Nitrogen ; Nitrogen dioxide ; Nitrogen oxides ; Organic chemistry ; Original Paper ; Power supplies ; Vapor phases</subject><ispartof>Plasma chemistry and plasma processing, 2019-05, Vol.39 (3), p.643-666</ispartof><rights>Springer Science+Business Media, LLC, part of Springer Nature 2019</rights><rights>Copyright Springer Nature B.V. 2019</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c385t-c21474f3541886f276f16f51ec31eb12f6f6e766b457cbceedcc6ef723a0250b3</citedby><cites>FETCH-LOGICAL-c385t-c21474f3541886f276f16f51ec31eb12f6f6e766b457cbceedcc6ef723a0250b3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1007/s11090-019-09981-w$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1007/s11090-019-09981-w$$EHTML$$P50$$Gspringer$$H</linktohtml><link.rule.ids>315,781,785,27929,27930,41493,42562,51324</link.rule.ids></links><search><creatorcontrib>Wandell, Robert J.</creatorcontrib><creatorcontrib>Wang, Huihui</creatorcontrib><creatorcontrib>Bulusu, Radha K. M.</creatorcontrib><creatorcontrib>Gallan, Rachel O.</creatorcontrib><creatorcontrib>Locke, Bruce R.</creatorcontrib><title>Formation of Nitrogen Oxides by Nanosecond Pulsed Plasma Discharges in Gas–Liquid Reactors</title><title>Plasma chemistry and plasma processing</title><addtitle>Plasma Chem Plasma Process</addtitle><description>A gas–liquid-film flow reactor with a nanosecond pulsed power supply was utilized to produce nitrogen oxides from Ar/N
2
mixtures (gas phase) and deionized water (liquid phase). Chemical analysis of the stable products found in both the gas and liquid phases was performed and chemical quenching was incorporated for the liquid phase samples in order to eliminate post plasma reactions. Significant amounts of NO and NO
2
in the gas phase and
NO
2
-
and
NO
3
-
in the liquid phase were determined using FTIR spectroscopy and ion chromatography, respectively. The production rate of all nitrogen oxides produced increased significantly with N
2
concentration while H
2
O
2
formation decreased slightly. The gas temperature of the plasma was approximately 525 K and was unaffected by N
2
concentration while the electron density ranged from 1 × 10
17
cm
−3
in pure Ar to 5.5 × 10
17
cm
−3
in 28% N
2
. The role of the
·
OH
in the reaction pathway was assessed by adding CO as a gas phase radical scavenger showing that
·
OH
is essential for conversion of the gas phase NO and NO
2
into water soluble
NO
2
-
and
NO
3
-
. Conversely, atomic oxygen originating from water is likely responsible for NO and NO
2
generation. Experiments with N
2
/O
2
/Ar mixtures and air showed a significant increase in NO
2
production caused by the additional generation of reactive oxygen species. An overall energy yield for all nitrogen oxides produced in the most efficient case was 50 eV/molecule.</description><subject>Atomic oxygen</subject><subject>Characterization and Evaluation of Materials</subject><subject>Chemical analysis</subject><subject>Chemistry</subject><subject>Chemistry and Materials Science</subject><subject>Classical Mechanics</subject><subject>Deionization</subject><subject>Electron density</subject><subject>Fourier transforms</subject><subject>Gas temperature</subject><subject>Hydrogen peroxide</subject><subject>Inorganic Chemistry</subject><subject>Liquid phases</subject><subject>Mechanical Engineering</subject><subject>Nitrogen</subject><subject>Nitrogen dioxide</subject><subject>Nitrogen oxides</subject><subject>Organic chemistry</subject><subject>Original Paper</subject><subject>Power supplies</subject><subject>Vapor phases</subject><issn>0272-4324</issn><issn>1572-8986</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2019</creationdate><recordtype>article</recordtype><recordid>eNp9kM1KAzEUhYMoWKsv4CrgejQ_M0lmKdVWobQiuhNCJpPUlHbSJjPU7nwH39AnMTqCO1fnLr7vXDgAnGN0iRHiVxFjVKIM4TJDZSlwtjsAA1xwkolSsEMwQCTdOSX5MTiJcYlQ0igfgJexD2vVOt9Ab-HMtcEvTAPnb642EVZ7OFONj0b7poYP3SqaFCsV1wreuKhfVVgkzDVwouLn-8fUbTtXw0ejdOtDPAVHViXn7DeH4Hl8-zS6y6bzyf3oepppKoo20wTnPLe0yLEQzBLOLGa2wEZTbCpMLLPMcMaqvOC60sbUWjNjOaEKkQJVdAgu-t5N8NvOxFYufRea9FISQnEpEGMiUaSndPAxBmPlJri1CnuJkfxeUfYryrSi_FlR7pJEeykmuFmY8Ff9j_UFcbp24w</recordid><startdate>20190501</startdate><enddate>20190501</enddate><creator>Wandell, Robert J.</creator><creator>Wang, Huihui</creator><creator>Bulusu, Radha K. M.</creator><creator>Gallan, Rachel O.</creator><creator>Locke, Bruce R.</creator><general>Springer US</general><general>Springer Nature B.V</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20190501</creationdate><title>Formation of Nitrogen Oxides by Nanosecond Pulsed Plasma Discharges in Gas–Liquid Reactors</title><author>Wandell, Robert J. ; Wang, Huihui ; Bulusu, Radha K. M. ; Gallan, Rachel O. ; Locke, Bruce R.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c385t-c21474f3541886f276f16f51ec31eb12f6f6e766b457cbceedcc6ef723a0250b3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2019</creationdate><topic>Atomic oxygen</topic><topic>Characterization and Evaluation of Materials</topic><topic>Chemical analysis</topic><topic>Chemistry</topic><topic>Chemistry and Materials Science</topic><topic>Classical Mechanics</topic><topic>Deionization</topic><topic>Electron density</topic><topic>Fourier transforms</topic><topic>Gas temperature</topic><topic>Hydrogen peroxide</topic><topic>Inorganic Chemistry</topic><topic>Liquid phases</topic><topic>Mechanical Engineering</topic><topic>Nitrogen</topic><topic>Nitrogen dioxide</topic><topic>Nitrogen oxides</topic><topic>Organic chemistry</topic><topic>Original Paper</topic><topic>Power supplies</topic><topic>Vapor phases</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Wandell, Robert J.</creatorcontrib><creatorcontrib>Wang, Huihui</creatorcontrib><creatorcontrib>Bulusu, Radha K. M.</creatorcontrib><creatorcontrib>Gallan, Rachel O.</creatorcontrib><creatorcontrib>Locke, Bruce R.</creatorcontrib><collection>CrossRef</collection><jtitle>Plasma chemistry and plasma processing</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Wandell, Robert J.</au><au>Wang, Huihui</au><au>Bulusu, Radha K. M.</au><au>Gallan, Rachel O.</au><au>Locke, Bruce R.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Formation of Nitrogen Oxides by Nanosecond Pulsed Plasma Discharges in Gas–Liquid Reactors</atitle><jtitle>Plasma chemistry and plasma processing</jtitle><stitle>Plasma Chem Plasma Process</stitle><date>2019-05-01</date><risdate>2019</risdate><volume>39</volume><issue>3</issue><spage>643</spage><epage>666</epage><pages>643-666</pages><issn>0272-4324</issn><eissn>1572-8986</eissn><abstract>A gas–liquid-film flow reactor with a nanosecond pulsed power supply was utilized to produce nitrogen oxides from Ar/N
2
mixtures (gas phase) and deionized water (liquid phase). Chemical analysis of the stable products found in both the gas and liquid phases was performed and chemical quenching was incorporated for the liquid phase samples in order to eliminate post plasma reactions. Significant amounts of NO and NO
2
in the gas phase and
NO
2
-
and
NO
3
-
in the liquid phase were determined using FTIR spectroscopy and ion chromatography, respectively. The production rate of all nitrogen oxides produced increased significantly with N
2
concentration while H
2
O
2
formation decreased slightly. The gas temperature of the plasma was approximately 525 K and was unaffected by N
2
concentration while the electron density ranged from 1 × 10
17
cm
−3
in pure Ar to 5.5 × 10
17
cm
−3
in 28% N
2
. The role of the
·
OH
in the reaction pathway was assessed by adding CO as a gas phase radical scavenger showing that
·
OH
is essential for conversion of the gas phase NO and NO
2
into water soluble
NO
2
-
and
NO
3
-
. Conversely, atomic oxygen originating from water is likely responsible for NO and NO
2
generation. Experiments with N
2
/O
2
/Ar mixtures and air showed a significant increase in NO
2
production caused by the additional generation of reactive oxygen species. An overall energy yield for all nitrogen oxides produced in the most efficient case was 50 eV/molecule.</abstract><cop>New York</cop><pub>Springer US</pub><doi>10.1007/s11090-019-09981-w</doi><tpages>24</tpages></addata></record> |
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| ispartof | Plasma chemistry and plasma processing, 2019-05, Vol.39 (3), p.643-666 |
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| language | eng |
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| source | SpringerNature Journals |
| subjects | Atomic oxygen Characterization and Evaluation of Materials Chemical analysis Chemistry Chemistry and Materials Science Classical Mechanics Deionization Electron density Fourier transforms Gas temperature Hydrogen peroxide Inorganic Chemistry Liquid phases Mechanical Engineering Nitrogen Nitrogen dioxide Nitrogen oxides Organic chemistry Original Paper Power supplies Vapor phases |
| title | Formation of Nitrogen Oxides by Nanosecond Pulsed Plasma Discharges in Gas–Liquid Reactors |
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