Nanocrystalline silicon carbide films for solar photovoltaics: The role of dangling-bond defects

Thin films of microcrystalline hydrogenated silicon (µc-Si:H) and nanocrystalline silicon carbide (nc-SiC:H) provide a new class of advanced nanostructured materials for solar photovoltaic (PV) devices. We have worked on the fabrication, characterization, and application of these materials for thin...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Pure and applied chemistry 2008-10, Vol.80 (10), p.2141-2150
Hauptverfasser: Lim, Koeng Su, Shevaleevskiy, Oleg
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Thin films of microcrystalline hydrogenated silicon (µc-Si:H) and nanocrystalline silicon carbide (nc-SiC:H) provide a new class of advanced nanostructured materials for solar photovoltaic (PV) devices. We have worked on the fabrication, characterization, and application of these materials for thin film PV solar cells based on amorphous silicon. Here we present an overview of the preparation and characterization methods for heterogeneous SiC:H-based layers. Hydrogenated nc-SiC:H thin film materials with high crystalline volume fraction were deposited using photo-assisted chemical vapor deposition (photo-CVD) technique. The behavior of spin-containing dangling-bond (DB) defects was performed using electron spin resonance (ESR) and transport measurements as a function of sample crystallinity, doping level, and temperature. The electronic and structural properties of intrinsic and doped µc-Si:H and nc-SiC:H thin films are reviewed with the emphasis of the essential role of DB defects on the photoelectronic transport parameters.
ISSN:0033-4545
1365-3075
DOI:10.1351/pac200880102141