Mo/Si Multilayer Mirrors with B4C and Be Barrier Layers

— Conventional Mo/Si mirrors and mirrors with B 4 C and Be barrier layers, designed for reflection at wavelengths around 13.5 nm, are fabricated using magnetron sputtering and studied. Their reflectance is measured at different grazing angles and at different wavelengths. Four-component multilayer m...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Surface investigation, x-ray, synchrotron and neutron techniques x-ray, synchrotron and neutron techniques, 2019-03, Vol.13 (2), p.169-172
Hauptverfasser: Zuyev, S. Yu, Pariev, D. E., Pleshkov, R. S., Polkovnikov, V. N., Salashchenko, N. N., Svechnikov, M. V., Sertsu, M. G., Sokolov, A., Chkhalo, N. I., Schäfers, F.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:— Conventional Mo/Si mirrors and mirrors with B 4 C and Be barrier layers, designed for reflection at wavelengths around 13.5 nm, are fabricated using magnetron sputtering and studied. Their reflectance is measured at different grazing angles and at different wavelengths. Four-component multilayer mirrors of the Mo/Be/Si/B 4 C type are shown to surpass, in terms of the reflection coefficient, their Mo/Si and Mo/Si/B 4 C counterparts by 2 and 1%, respectively, at wavelengths of incident radiation of 12.4, 12.7, 13.0, and 13.5 nm.
ISSN:1027-4510
1819-7094
DOI:10.1134/S1027451019020216