On the Possibility of Manufacturing Strained InAs/GaSb Superlattices by the MOCVD Method

The first results showing the possibility of manufacturing InAs/GaSb superlattices by the metal-organic chemical vapor deposition (MOCVD) method are presented. The possibility of manufacturing heterostructures with an InAs/GaSb strained superlattice with layer thicknesses of 2–4 nm is experimentally...

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Veröffentlicht in:Semiconductors (Woodbury, N.Y.) N.Y.), 2019-02, Vol.53 (2), p.260-263
Hauptverfasser: Levin, R. V., Nevedomskyi, V. N., Bazhenov, N. L., Zegrya, G. G., Pushnyi, B. V., Mizerov, M. N.
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Sprache:eng
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Zusammenfassung:The first results showing the possibility of manufacturing InAs/GaSb superlattices by the metal-organic chemical vapor deposition (MOCVD) method are presented. The possibility of manufacturing heterostructures with an InAs/GaSb strained superlattice with layer thicknesses of 2–4 nm is experimentally demonstrated. The 77-K electroluminescence spectra of the structures show a long-wavelength peak at around 5 . 0 μm (0 . 25 eV). This peak is probably associated with the strained superlattice because solid solutions that could form on the basis of composite compounds do not provide this carrier-recombination energy.
ISSN:1063-7826
1090-6479
DOI:10.1134/S1063782619020155