Bioapplication of TiN thin films deposited using high power impulse magnetron sputtering

Titanium nitride (TiN) has been deposited on TiAl6V4 using a reactive high-power impulse magnetron sputtering (HiPIMS) deposition technique and investigated for use as a bio-coating. During HiPIMS deposition, the peak current of the Ti target was varied from 75 to 175 A through adjusting the frequency from 200 to 100 Hz. Plasma diagnosis shows that, as compared to DC sputtering deposition process, all the peak currents and maximum powers are higher in the HiPIMS deposition process. The high peak current and maximum power in the HiPIMS process help the ionization of the sputtered Ti and also increase the amount of N2+ species in the plasma, hence leading to a high N/Ti ratio of the TiN film. Therefore, the resulting TiN exhibits great corrosion resistance in simulated bodily fluid and shows excellent cell viability against the osteoblast-like MG-63 cells among other TiN samples. •Reactive HiPIMS-deposited TiN has been investigated for use as a bio-coating.•High Imax enhances the ionization of the sputtered Ti and N2 gas.•An Imax of 110 A gives a high N/Ti ratio and the highest Rp in the PBS.•HiPIMS deposited TiN on Ti6Al4V improves the biocompatibility of the Ti6Al4V.