Preparation of ultrafine-grained/nanostructured tungsten materials: An overview
Tungsten has been considered as one of suitable candidate as plasma-facing material for the first wall of fusion devices. However, the application of tungsten in fusion reactions presents risk because of the brittleness, high ductile–brittle transition temperature, and other defects of tungsten mate...
Gespeichert in:
Veröffentlicht in: | Journal of alloys and compounds 2019-03, Vol.779, p.926-941 |
---|---|
Hauptverfasser: | , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | Tungsten has been considered as one of suitable candidate as plasma-facing material for the first wall of fusion devices. However, the application of tungsten in fusion reactions presents risk because of the brittleness, high ductile–brittle transition temperature, and other defects of tungsten materials. Studies have shown that ultrafine-grained/nanostructured tungsten materials can improve these problems. In its first part this article describes the powder metallurgy techniques for the preparation of ultrafine-grained/nanostructured tungsten. And the second part of this article reviews bulk processes for the preparation. The possibility of preparing ultrafine-grained/nanostructured tungsten and referenceable process parameters are described. By describing the mechanical properties and irradiation performance of ultrafine-grained/nanostructured tungsten, the research prospects and development directions of tungsten materials for fusion reactors are indicated.
•Formation mechanism of the ultrafine-grained/nanostructured arrangements and their effects on the properties are reviewed.•Adding Ti played a positive role in improving the oxidation resistance of the alloy.•WCrY alloy has more excellent oxidation resistance than WCrTi ternary alloy.•WCrY alloy after annealing has better oxidation resistance. |
---|---|
ISSN: | 0925-8388 1873-4669 |
DOI: | 10.1016/j.jallcom.2018.11.279 |