Nb-doped Ti^sub 2^ O^sub 3^ Films Deposited Through Grid-Assisted Magnetron Sputtering on Glass Substrate: Electrical and Optical Analysis

Niobium doped dititanium trioxide (Ti2 O3 :Nb) films were deposited on glass substrates, through grid-assisted magnetron sputtering. The Ti2 O3 :Nb films were characterized by X-ray diffraction (XRD), electrical conductivity and optical properties. Film deposition was carried out in two different substrate bias modes: DC and unipolar pulsed. Results show that the negative-pulsed mode improves conductivity and crystallinity. The XRD results show peaks corresponding crystallographic planes of Ti2 O3 . No niobium oxide Nbx Oy peaks were observed, which indicates that niobium oxide if formed, is amorphous, and/or substituted Nb atoms remain in a solid solution within the Ti2O3 structure. It was observed that "as-deposited" Ti2 O3 :Nb films (without post annealing) are transparent and electrical conductive, with transmittance that reaches 60% in the visible light wavelength despite the considerable thickness of the film and a miminum resistivity of 2x10-2 Ω.cm which indicates that there is potential for application as Transparent Conductive Oxide (TCO).