Ultra-Low Thermal Conductivity in W/Al^sub 2^O^sub 3^ Nanolaminates
Atomic layer deposition and magnetron sputter deposition were used to synthesize thin-film multilayers of W/Al^sub 2^O^sub 3^. With individual layers only a few nanometers thick, the high interface density produced a strong impediment to heat transfer, giving rise to a thermal conductivity of ~0.6 w...
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Veröffentlicht in: | Science (American Association for the Advancement of Science) 2004-02, Vol.303 (5660), p.989 |
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Hauptverfasser: | , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Atomic layer deposition and magnetron sputter deposition were used to synthesize thin-film multilayers of W/Al^sub 2^O^sub 3^. With individual layers only a few nanometers thick, the high interface density produced a strong impediment to heat transfer, giving rise to a thermal conductivity of ~0.6 watts per meter per kelvin. This result suggests that high densities of iterfaces between dissimilar materials my provide a route for the production of thermal barriers with ultra-low thermal conductivity. [PUBLICATION ABSTRACT] |
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ISSN: | 0036-8075 1095-9203 |