Formation of a passivatingCH3NH3PbI3/PbI2 interface during moderateheating of CH3NH3PbI3 layers

Layers of CH3NH3PbI3 are investigated by modulatedsurfacephotovoltage spectroscopy (SPV) during heating in vacuum. As preparedCH3NH3PbI3 layers behave as a p-type dopedsemiconductor in depletion with a band gap of 1.5 eV. Afterheating to 140 °C the sign of the SPV signals ofCH3NH3PbI3 changed concom...

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Veröffentlicht in:Applied physics letters 2013-10, Vol.103 (18)
Hauptverfasser: Supasai, T, Rujisamphan, N, Ullrich, K, Chemseddine, A, Dittrich Th
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creator Supasai, T
Rujisamphan, N
Ullrich, K
Chemseddine, A
Dittrich Th
description Layers of CH3NH3PbI3 are investigated by modulatedsurfacephotovoltage spectroscopy (SPV) during heating in vacuum. As preparedCH3NH3PbI3 layers behave as a p-type dopedsemiconductor in depletion with a band gap of 1.5 eV. Afterheating to 140 °C the sign of the SPV signals ofCH3NH3PbI3 changed concomitant with the appearance of asecond band gap at2.36 eV ascribed to PbI2, and SPV signals related to charge separation fromdefect states were reduced after moderate heating.
doi_str_mv 10.1063/1.4826116
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subjects Applied physics
Energy gap
Heating
title Formation of a passivatingCH3NH3PbI3/PbI2 interface during moderateheating of CH3NH3PbI3 layers
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