Nanobridge gate-all-around phototransistors for electro-optical OR gate circuit and frequency doubler applications
We fabricated photosensitive silicon-nanobridge 3-D field-effect-transistors and demonstrated their analog and digital applications. The channels of the transistors were implemented by nanowires, grown and bridged between pairs of silicon electrodes using the vapor-liquid-solid technique. Whilst cha...
Gespeichert in:
Veröffentlicht in: | Applied physics letters 2014-01, Vol.104 (2), p.22110 |
---|---|
Hauptverfasser: | , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | We fabricated photosensitive silicon-nanobridge 3-D field-effect-transistors and demonstrated their analog and digital applications. The channels of the transistors were implemented by nanowires, grown and bridged between pairs of silicon electrodes using the vapor-liquid-solid technique. Whilst characteristics of the nanowire transistor such as the inverse sub-threshold slopes, the on-current, and the threshold voltage remained nearly unaffected by illumination, magnitude of the off-current was significantly increased by up to three orders of magnitude with increasing intensity. Such off-current modulation enabled by illumination offers opportunities for applications such as electro-optical OR gate circuit elements and frequency doublers. |
---|---|
ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.4862328 |