Optical properties of ultra-thin silicon films deposited on nanostructured anodic alumina surfaces
Light trapping is crucial for thin film silicon solar cells and is often achieved by expensive, clean-room intensive nano-patterning methods. In this work, nanostructured silicon thin films were realized by direct deposition on substrates with nanoscale features prepared by simple and scalable fabri...
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Veröffentlicht in: | Applied physics letters 2014-02, Vol.104 (8) |
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creator | Wang, Shu-Yi Borca-Tasciuc, Diana-Andra Kaminski, Deborah A. |
description | Light trapping is crucial for thin film silicon solar cells and is often achieved by expensive, clean-room intensive nano-patterning methods. In this work, nanostructured silicon thin films were realized by direct deposition on substrates with nanoscale features prepared by simple and scalable fabrication based on electrochemical methods and wet etching. A broadband and angle-insensitive absorption enhancement of thin film silicon was observed. The photocurrent density shows improvements up to ∼40% in the AM 1.5 spectrum when comparing to the same thin film silicon deposited on smooth substrates. This approach not only demonstrates the advantage of simple fabrication but also has potential for ultra thin film photovoltaic applications. |
doi_str_mv | 10.1063/1.4867092 |
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In this work, nanostructured silicon thin films were realized by direct deposition on substrates with nanoscale features prepared by simple and scalable fabrication based on electrochemical methods and wet etching. A broadband and angle-insensitive absorption enhancement of thin film silicon was observed. The photocurrent density shows improvements up to ∼40% in the AM 1.5 spectrum when comparing to the same thin film silicon deposited on smooth substrates. This approach not only demonstrates the advantage of simple fabrication but also has potential for ultra thin film photovoltaic applications.</description><identifier>ISSN: 0003-6951</identifier><identifier>EISSN: 1077-3118</identifier><identifier>DOI: 10.1063/1.4867092</identifier><language>eng</language><publisher>Melville: American Institute of Physics</publisher><subject>Aluminum oxide ; Applied physics ; Broadband ; Cleanrooms ; Nanostructure ; Optical properties ; Photoelectric effect ; Photoelectric emission ; Photovoltaic cells ; Silicon ; Silicon films ; Silicon substrates ; Solar cells ; Thin films</subject><ispartof>Applied physics letters, 2014-02, Vol.104 (8)</ispartof><rights>2014 AIP Publishing LLC.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c257t-fd093599473b2d5ac836e4b6f8d743d9458d5d8c4a3f491217b339166978d0fa3</citedby><cites>FETCH-LOGICAL-c257t-fd093599473b2d5ac836e4b6f8d743d9458d5d8c4a3f491217b339166978d0fa3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Wang, Shu-Yi</creatorcontrib><creatorcontrib>Borca-Tasciuc, Diana-Andra</creatorcontrib><creatorcontrib>Kaminski, Deborah A.</creatorcontrib><title>Optical properties of ultra-thin silicon films deposited on nanostructured anodic alumina surfaces</title><title>Applied physics letters</title><description>Light trapping is crucial for thin film silicon solar cells and is often achieved by expensive, clean-room intensive nano-patterning methods. In this work, nanostructured silicon thin films were realized by direct deposition on substrates with nanoscale features prepared by simple and scalable fabrication based on electrochemical methods and wet etching. A broadband and angle-insensitive absorption enhancement of thin film silicon was observed. The photocurrent density shows improvements up to ∼40% in the AM 1.5 spectrum when comparing to the same thin film silicon deposited on smooth substrates. This approach not only demonstrates the advantage of simple fabrication but also has potential for ultra thin film photovoltaic applications.</description><subject>Aluminum oxide</subject><subject>Applied physics</subject><subject>Broadband</subject><subject>Cleanrooms</subject><subject>Nanostructure</subject><subject>Optical properties</subject><subject>Photoelectric effect</subject><subject>Photoelectric emission</subject><subject>Photovoltaic cells</subject><subject>Silicon</subject><subject>Silicon films</subject><subject>Silicon substrates</subject><subject>Solar cells</subject><subject>Thin films</subject><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2014</creationdate><recordtype>article</recordtype><recordid>eNotUMtKAzEADKJgrR78g4AnD1uTzfsoxRcUetFzyOaBKdvNmmQP_r2R9jTMMMwwA8A9RhuMOHnCGyq5QKq_ACuMhOgIxvISrBBCpOOK4WtwU8qhUdYTsgLDfq7RmhHOOc0-1-gLTAEuY82mq99xgiWO0aYJhjgeC3R-TiVW72CTJjOlUvNi65Kb0piLFppxOcbJwLLkYKwvt-AqmLH4uzOuwdfry-f2vdvt3z62z7vO9kzULjikCFOKCjL0jhkrCfd04EE6QYlTlEnHnLTUkEAV7rEYCFGYcyWkQ8GQNXg45bYpP4svVR_SkqdWqXvcC4ERE6y5Hk8um1Mp2Qc953g0-VdjpP8v1FifLyR_dDBjxw</recordid><startdate>20140224</startdate><enddate>20140224</enddate><creator>Wang, Shu-Yi</creator><creator>Borca-Tasciuc, Diana-Andra</creator><creator>Kaminski, Deborah A.</creator><general>American Institute of Physics</general><scope>AAYXX</scope><scope>CITATION</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope></search><sort><creationdate>20140224</creationdate><title>Optical properties of ultra-thin silicon films deposited on nanostructured anodic alumina surfaces</title><author>Wang, Shu-Yi ; Borca-Tasciuc, Diana-Andra ; Kaminski, Deborah A.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c257t-fd093599473b2d5ac836e4b6f8d743d9458d5d8c4a3f491217b339166978d0fa3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2014</creationdate><topic>Aluminum oxide</topic><topic>Applied physics</topic><topic>Broadband</topic><topic>Cleanrooms</topic><topic>Nanostructure</topic><topic>Optical properties</topic><topic>Photoelectric effect</topic><topic>Photoelectric emission</topic><topic>Photovoltaic cells</topic><topic>Silicon</topic><topic>Silicon films</topic><topic>Silicon substrates</topic><topic>Solar cells</topic><topic>Thin films</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Wang, Shu-Yi</creatorcontrib><creatorcontrib>Borca-Tasciuc, Diana-Andra</creatorcontrib><creatorcontrib>Kaminski, Deborah A.</creatorcontrib><collection>CrossRef</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Wang, Shu-Yi</au><au>Borca-Tasciuc, Diana-Andra</au><au>Kaminski, Deborah A.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Optical properties of ultra-thin silicon films deposited on nanostructured anodic alumina surfaces</atitle><jtitle>Applied physics letters</jtitle><date>2014-02-24</date><risdate>2014</risdate><volume>104</volume><issue>8</issue><issn>0003-6951</issn><eissn>1077-3118</eissn><abstract>Light trapping is crucial for thin film silicon solar cells and is often achieved by expensive, clean-room intensive nano-patterning methods. In this work, nanostructured silicon thin films were realized by direct deposition on substrates with nanoscale features prepared by simple and scalable fabrication based on electrochemical methods and wet etching. A broadband and angle-insensitive absorption enhancement of thin film silicon was observed. The photocurrent density shows improvements up to ∼40% in the AM 1.5 spectrum when comparing to the same thin film silicon deposited on smooth substrates. This approach not only demonstrates the advantage of simple fabrication but also has potential for ultra thin film photovoltaic applications.</abstract><cop>Melville</cop><pub>American Institute of Physics</pub><doi>10.1063/1.4867092</doi></addata></record> |
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subjects | Aluminum oxide Applied physics Broadband Cleanrooms Nanostructure Optical properties Photoelectric effect Photoelectric emission Photovoltaic cells Silicon Silicon films Silicon substrates Solar cells Thin films |
title | Optical properties of ultra-thin silicon films deposited on nanostructured anodic alumina surfaces |
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