Optical properties of ultra-thin silicon films deposited on nanostructured anodic alumina surfaces

Light trapping is crucial for thin film silicon solar cells and is often achieved by expensive, clean-room intensive nano-patterning methods. In this work, nanostructured silicon thin films were realized by direct deposition on substrates with nanoscale features prepared by simple and scalable fabri...

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Veröffentlicht in:Applied physics letters 2014-02, Vol.104 (8)
Hauptverfasser: Wang, Shu-Yi, Borca-Tasciuc, Diana-Andra, Kaminski, Deborah A.
Format: Artikel
Sprache:eng
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Zusammenfassung:Light trapping is crucial for thin film silicon solar cells and is often achieved by expensive, clean-room intensive nano-patterning methods. In this work, nanostructured silicon thin films were realized by direct deposition on substrates with nanoscale features prepared by simple and scalable fabrication based on electrochemical methods and wet etching. A broadband and angle-insensitive absorption enhancement of thin film silicon was observed. The photocurrent density shows improvements up to ∼40% in the AM 1.5 spectrum when comparing to the same thin film silicon deposited on smooth substrates. This approach not only demonstrates the advantage of simple fabrication but also has potential for ultra thin film photovoltaic applications.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.4867092