Growth of homogeneous single-layer graphene on Ni-Ge binary substrate

In contrast to the commonly used chemical vapor deposition growth that leads to multilayer graphene formation by carbon segregation from the Ni bulk, we designed a Ni-Ge binary system to directly grow graphene film on Ni-Ge binary substrate, via chemical vapor deposition with methane and hydrogen ga...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Applied physics letters 2014-02, Vol.104 (6)
Hauptverfasser: Wang, Gang, Chen, Da, Lu, Zitong, Guo, Qinglei, Ye, Lin, Wei, Xing, Ding, Guqiao, Zhang, Miao, Di, Zengfeng, Liu, Su
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:In contrast to the commonly used chemical vapor deposition growth that leads to multilayer graphene formation by carbon segregation from the Ni bulk, we designed a Ni-Ge binary system to directly grow graphene film on Ni-Ge binary substrate, via chemical vapor deposition with methane and hydrogen gas as precursors. Our system fully overcomes the fundamental limitations of Ni and yields homogenous single layer graphene over large areas. The chemical vapor deposition growth of graphene on Ni-Ge binary substrate shows that self limiting monolayer graphene growth can be obtained on these substrate.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.4864643