Deposition of optical quality Cu/Ti films
Optimization of deposition parameters of a dc magnetron sputtering system was performed to obtain good quality multilayer films of Cu/Ti. Two bilayers of Cu/Ti and Ti/Cu were deposited and characterized by X-Ray reflectometry (XRR) to obtain the structural parameters like thickness, roughness and de...
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| creator | Swain Mitali Bhattacharya Debarati Basu Saibal |
| description | Optimization of deposition parameters of a dc magnetron sputtering system was performed to obtain good quality multilayer films of Cu/Ti. Two bilayers of Cu/Ti and Ti/Cu were deposited and characterized by X-Ray reflectometry (XRR) to obtain the structural parameters like thickness, roughness and density. Analyses of these XRR data helped optimize deposition parameters of a Cu/Ti multilayer, which was also characterized by XRR and found to be of very good reflectance with Bragg peaks visible up to 4th order. Further the interface asymmetry observed in the bilayers as well as in the multilayer is also presented in this paper. |
| doi_str_mv | 10.1063/1.4872812 |
| format | Conference Proceeding |
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Two bilayers of Cu/Ti and Ti/Cu were deposited and characterized by X-Ray reflectometry (XRR) to obtain the structural parameters like thickness, roughness and density. Analyses of these XRR data helped optimize deposition parameters of a Cu/Ti multilayer, which was also characterized by XRR and found to be of very good reflectance with Bragg peaks visible up to 4th order. Further the interface asymmetry observed in the bilayers as well as in the multilayer is also presented in this paper.</description><identifier>ISSN: 0094-243X</identifier><identifier>EISSN: 1551-7616</identifier><identifier>DOI: 10.1063/1.4872812</identifier><language>eng</language><publisher>Melville: American Institute of Physics</publisher><subject>Bilayers ; Copper ; Deposition ; Magnetron sputtering ; Multilayers ; Parameters ; Reflectance ; Reflectometry ; Thickness</subject><ispartof>AIP conference proceedings, 2014, Vol.1591 (1), p.947</ispartof><rights>2014 AIP Publishing LLC.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>309,310,780,784,789,790,23929,23930,25139,27924</link.rule.ids></links><search><creatorcontrib>Swain Mitali</creatorcontrib><creatorcontrib>Bhattacharya Debarati</creatorcontrib><creatorcontrib>Basu Saibal</creatorcontrib><title>Deposition of optical quality Cu/Ti films</title><title>AIP conference proceedings</title><description>Optimization of deposition parameters of a dc magnetron sputtering system was performed to obtain good quality multilayer films of Cu/Ti. 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Further the interface asymmetry observed in the bilayers as well as in the multilayer is also presented in this paper.</description><subject>Bilayers</subject><subject>Copper</subject><subject>Deposition</subject><subject>Magnetron sputtering</subject><subject>Multilayers</subject><subject>Parameters</subject><subject>Reflectance</subject><subject>Reflectometry</subject><subject>Thickness</subject><issn>0094-243X</issn><issn>1551-7616</issn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2014</creationdate><recordtype>conference_proceeding</recordtype><recordid>eNotzctKAzEUgOEgCo7VhW8QcOUi7Tm5ZynjFQrdtOCuzGQSSBmbaZNZ-PYKuvp330_IPcISQYsVLqU13CK_IA0qhcxo1JekAXCScSk-r8lNKQcA7oyxDXl8DlMuqaZ8pDnSPNXku5Ge5m5M9Zu282qbaEzjV7klV7EbS7j774LsXl-27Ttbb94-2qc1m9CKyuTgwPNeRO2DCr1XXsQe-OCEBBWDVcYMmusonbdOxaiCj9wqqQUEZTsnFuThz53O-TSHUveHPJ-Pv8s9R260RQsofgD7WkE_</recordid><startdate>20140424</startdate><enddate>20140424</enddate><creator>Swain Mitali</creator><creator>Bhattacharya Debarati</creator><creator>Basu Saibal</creator><general>American Institute of Physics</general><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope></search><sort><creationdate>20140424</creationdate><title>Deposition of optical quality Cu/Ti films</title><author>Swain Mitali ; Bhattacharya Debarati ; Basu Saibal</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-p183t-4d90c2b3f6ce5ebc5c3fb02d93405fe8577d626f49c895ff5ecf2854630e58a93</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2014</creationdate><topic>Bilayers</topic><topic>Copper</topic><topic>Deposition</topic><topic>Magnetron sputtering</topic><topic>Multilayers</topic><topic>Parameters</topic><topic>Reflectance</topic><topic>Reflectometry</topic><topic>Thickness</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Swain Mitali</creatorcontrib><creatorcontrib>Bhattacharya Debarati</creatorcontrib><creatorcontrib>Basu Saibal</creatorcontrib><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Swain Mitali</au><au>Bhattacharya Debarati</au><au>Basu Saibal</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Deposition of optical quality Cu/Ti films</atitle><btitle>AIP conference proceedings</btitle><date>2014-04-24</date><risdate>2014</risdate><volume>1591</volume><issue>1</issue><epage>947</epage><issn>0094-243X</issn><eissn>1551-7616</eissn><abstract>Optimization of deposition parameters of a dc magnetron sputtering system was performed to obtain good quality multilayer films of Cu/Ti. Two bilayers of Cu/Ti and Ti/Cu were deposited and characterized by X-Ray reflectometry (XRR) to obtain the structural parameters like thickness, roughness and density. Analyses of these XRR data helped optimize deposition parameters of a Cu/Ti multilayer, which was also characterized by XRR and found to be of very good reflectance with Bragg peaks visible up to 4th order. Further the interface asymmetry observed in the bilayers as well as in the multilayer is also presented in this paper.</abstract><cop>Melville</cop><pub>American Institute of Physics</pub><doi>10.1063/1.4872812</doi></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0094-243X |
| ispartof | AIP conference proceedings, 2014, Vol.1591 (1), p.947 |
| issn | 0094-243X 1551-7616 |
| language | eng |
| recordid | cdi_proquest_journals_2127681801 |
| source | AIP Journals Complete |
| subjects | Bilayers Copper Deposition Magnetron sputtering Multilayers Parameters Reflectance Reflectometry Thickness |
| title | Deposition of optical quality Cu/Ti films |
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