Deposition of optical quality Cu/Ti films

Optimization of deposition parameters of a dc magnetron sputtering system was performed to obtain good quality multilayer films of Cu/Ti. Two bilayers of Cu/Ti and Ti/Cu were deposited and characterized by X-Ray reflectometry (XRR) to obtain the structural parameters like thickness, roughness and density. Analyses of these XRR data helped optimize deposition parameters of a Cu/Ti multilayer, which was also characterized by XRR and found to be of very good reflectance with Bragg peaks visible up to 4th order. Further the interface asymmetry observed in the bilayers as well as in the multilayer is also presented in this paper.