(111) Orientation preferred L10 FePtB patterned by block copolymer templating

The (111) orientation preferred L10 FePtB has been obtained by post-deposition annealing sputtered FeB/Pt multilayers on thermally oxidized silicon substrates. Block copolymer templating was employed to pattern FeBPt film. A matrix study of etch time and etch angle showed that ion-milling at 75° for 3 min yielded the highest coercivity. Reannealing after patterning process was found to improve the crystalline structure and coercivity significantly. These results suggested (111) orientation preferred L10 FePt patterned by block copolymer templating may be promising for tilted media and bit patterned media.