High-temperature stability of thermoelectric Ca3Co4O9 thin films

An enhanced thermal stability in thermoelectric Ca3Co4O9 thin films up to 550 °C in an oxygen rich environment was demonstrated by high-temperature electrical and X-ray diffraction measurements. In contrast to generally performed heating in helium gas, it is shown that an oxygen/helium mixture provi...

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Veröffentlicht in:Applied physics letters 2015-04, Vol.106 (14)
Hauptverfasser: Brinks, P., Van Nong, N., Pryds, N., Rijnders, G., Huijben, M.
Format: Artikel
Sprache:eng
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Zusammenfassung:An enhanced thermal stability in thermoelectric Ca3Co4O9 thin films up to 550 °C in an oxygen rich environment was demonstrated by high-temperature electrical and X-ray diffraction measurements. In contrast to generally performed heating in helium gas, it is shown that an oxygen/helium mixture provides sufficient thermal contact, while preventing the previously disregarded formation of oxygen vacancies. Combining thermal cycling with electrical measurements proves to be a powerful tool to study the real intrinsic thermoelectric behaviour of oxide thin films at elevated temperatures.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.4917275