Oxygen partial pressure on the structural and electrical properties of CdZnO thin films

The Cd doped ZnO have versatile applications in the field of solar cells, Optoelectronic devices. The Cd doped ZnO thin films were prepared by reactive dc magnetron sputtering at different O2 Partial Pressures (1-3sccm) on glass substrate. The structure of the compound was determined by XRD, the mic...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The Cd doped ZnO have versatile applications in the field of solar cells, Optoelectronic devices. The Cd doped ZnO thin films were prepared by reactive dc magnetron sputtering at different O2 Partial Pressures (1-3sccm) on glass substrate. The structure of the compound was determined by XRD, the mictro structure was studied by FE-SEM, the absorption spectra studies were measured with UV-Vis-NIR spectrometer and electrical properties were studied by four probe method. The optical band gap was variation reported in this study. The minimum resistivity found at PO2=2.0sccm.
ISSN:0094-243X
1551-7616
DOI:10.1063/1.4917906