Ge1−x−ySixSny light emitting diodes on silicon for mid-infrared photonic applications
This paper reports initial the demonstration of prototype Ge1−x−ySixSny light emitting diodes with distinct direct and indirect edges and high quality I-V characteristics. The devices are fabricated on Si (100) wafers in heterostructure pin geometry [n-Ge/i-Ge1−x−ySixSny/p-Ge(Sn/Si)] using ultra low...
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Veröffentlicht in: | Journal of applied physics 2015-10, Vol.118 (13) |
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Hauptverfasser: | , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Online-Zugang: | Volltext |
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Zusammenfassung: | This paper reports initial the demonstration of prototype Ge1−x−ySixSny light emitting diodes with distinct direct and indirect edges and high quality I-V characteristics. The devices are fabricated on Si (100) wafers in heterostructure pin geometry [n-Ge/i-Ge1−x−ySixSny/p-Ge(Sn/Si)] using ultra low-temperature (T |
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ISSN: | 0021-8979 1089-7550 |
DOI: | 10.1063/1.4931770 |