Synthesis and nanoimprinting of high refractive index and highly transparent polythioethers based on thiol‐ene click chemistry

ABSTRACT This work demonstrates the UV nanoimprinting lithography (UV‐NIL) of high refractive index and highly transparent polythioethers based on thiol‐ene click chemistry. Herein, 9,9‐bis(3‐mercaptopropylphenylether)fluorene (BMPF) is designed as a new thiol monomer with a high refractive index, high transparency, and good processability for UV‐NIL. Colorless polythioethers are synthesized from BMPF and ene monomers under mild thiol‐ene click reaction conditions. Excellent transmittance (96%) of 400 nm light is observed in all the polymer films and high refractive index values of 1.5972–1.6382 are attained. UV‐NIL using thiol‐ene photopolymerization affords polymer nanoimprinting patterns with various features on the order of 100–500 nm without any fractures. To the best of our knowledge, this is the first report on UV‐NIL of high refractive index and highly transparent polymers. Through proper monomer and polymer design, novel polythioethers with suitable glass transition temperature (T g) values are developed with high refractive index, high transparency, and good UV‐NIL processability. Furthermore, UV‐NIL based on thiol‐ene click chemistry is accomplished at the nanoscale. © 2018 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2018, 56, 2175–2182 High refractive index and high transparent polythioethers with good UV nanoimprinting lithography (UV‐NIL) processability were developed by proper monomer and polymer design. These polymer nanoimprinting patterns with various features on the order of 100–500 nm were successfully fabricated without any fractures.