Droplet-based, high-brightness extreme ultraviolet laser plasma source for metrology

We report on the development of a high brightness source of extreme ultraviolet radiation (EUV) with a working wavelength of 13.5 nm. The source is based on a laser-produced plasma driven by pulsed radiation of a Nd:YAG laser system. Liquid droplets of Sn-In eutectic alloy were used as the source fuel. The droplets were created by a droplet generator operating in the jet break-up regime. The EUV emission properties of the plasma, including the emission spectrum, time profile, and conversion efficiency of laser radiation into useful 13.5 nm photons, have been characterized. Using the shadowgraphy technique, we demonstrated the production of corpuscular debris by the plasma source and the influence of the plasma on the neighboring droplet targets. The high-frequency laser operation was simulated by usage of the dual pulse regime. Based on the experimental results, we discuss the physical phenomena that could affect the source operation at high repetition rates. Finally, we estimate that an average source brightness of 1.2 kW/mm2 sr is feasible at a high repetition rate.