UV-photodetector based on NiO/diamond film

In this study, a NiO/diamond UV-photodetector has been fabricated and investigated. A single crystal diamond (SCD) layer was grown on a high-pressure-high-temperature Ib-type diamond substrate by using a microwave plasma chemical vapor deposition system. NiO films were deposited directly by the reac...

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Veröffentlicht in:Applied physics letters 2018-01, Vol.112 (3)
Hauptverfasser: Chang, Xiaohui, Wang, Yan-Feng, Zhang, Xiaofan, Liu, Zhangcheng, Fu, Jiao, Fan, Shuwei, Bu, Renan, Zhang, Jingwen, Wang, Wei, Wang, Hong-Xing, Wang, Jingjing
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Sprache:eng
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Zusammenfassung:In this study, a NiO/diamond UV-photodetector has been fabricated and investigated. A single crystal diamond (SCD) layer was grown on a high-pressure-high-temperature Ib-type diamond substrate by using a microwave plasma chemical vapor deposition system. NiO films were deposited directly by the reactive magnetron sputtering technique in a mixture gas of oxygen and argon onto the SCD layer. Gold films were patterned on NiO films as electrodes to form the metal-semiconductor-metal UV-photodetector which shows good repeatability and a 2 orders of magnitude UV/visible rejection ratio. Also, the NiO/diamond photodetector has a higher responsivity and a wider response range in contrast to a diamond photodetector.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.5004269