Nickel Oxide: Electron‐Blocking and Oxygen Evolution Catalyst Layers by Plasma‐Enhanced Atomic Layer Deposition of Nickel Oxide (Adv. Mater. Interfaces 16/2018)

Nickel Oxide: Electron‐Blocking and Oxygen Evolution Catalyst Layers by Plasma‐Enhanced Atomic Layer Deposition of Nickel Oxide (Adv. Mater. Interfaces 16/2018)

In article number 1701531, Alexander G. Hufnagel, Thomas Bein and co‐workers present the development and applications of a plasma‐enhanced atomic layer deposition process for nickel oxide. This method produces high‐purity, ultrathin conformal films using nickelocene as an inexpensive precursor. The...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Advanced materials interfaces 2018-08, Vol.5 (16), p.n/a
Hauptverfasser: Hufnagel, Alexander G., Henß, Ann‐Kathrin, Hoffmann, Ramona, Zeman, Otto E. O., Häringer, Sebastian, Fattakhova‐Rohlfing, Dina, Bein, Thomas
Format: Artikel
Sprache:eng
Schlagworte:
Atomic layer epitaxy
Atomic properties
blocking layers
Catalysis
Catalysts
Chemical evolution
electrocatalysis
Electrolysis
Electrolytic cells
nickel oxide
Nickel oxides
Photovoltaic cells
plasma‐enhanced atomic layer deposition
thin films
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:In article number 1701531, Alexander G. Hufnagel, Thomas Bein and co‐workers present the development and applications of a plasma‐enhanced atomic layer deposition process for nickel oxide. This method produces high‐purity, ultrathin conformal films using nickelocene as an inexpensive precursor. The films can be used as hole‐selective contacts in photovoltaic cells and as efficient oxygen evolution catalysts for water electrolysis.
ISSN:2196-7350
2196-7350
DOI:10.1002/admi.201870079