Reconstruction of concentration profiles in heterostructures with chemically modified interfaces

An approach for the reconstruction of the composition profiles of heterostructures with chemically modified interfaces is presented. It is based on the comprehensive simulation of the heterostructure growth stages and the compositional changes occurring at the depth profiling stage during sputtering by secondary ion mass spectrometry. Combining simulation of the growth and the concentration measurement process allows the calculation of the real concentration depth profiles of the heterostructure components. Within the framework of the proposed approach, the composition of the SiC:Ge/Ge/Si:Ge/Si heterostructure is analyzed and the real depth profiles were calculated.