Manufacturing of Sputtering Composite Targets Containing Phases of Co2FeSi or Co2MnSi Heusler Alloy
The paper presents a method for manufacturing mechanically strong sputtering composite targets containing the phase of the Co 2 FeSi or Co 2 MnSi Heusler alloy of the stoichiometric composition, which can be used for fabrication of spin electronic devices by high-frequency magnetron deposition and p...
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| Veröffentlicht in: | Technical physics 2018-07, Vol.63 (7), p.1002-1005 |
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| container_title | Technical physics |
| container_volume | 63 |
| creator | Demidov, E. S. Sdobnyakov, V. V. Vazenmiller, G. V. Chigirinskii, Yu. I. Dudin, Yu. A. Lesnikov, V. P. Trushin, V. N. Boldin, M. S. Belkin, O. A. Bobrov, A. A. Sakharov, N. V. |
| description | The paper presents a method for manufacturing mechanically strong sputtering composite targets containing the phase of the Co
2
FeSi or Co
2
MnSi Heusler alloy of the stoichiometric composition, which can be used for fabrication of spin electronic devices by high-frequency magnetron deposition and pulsed laser deposition of thin films. |
| doi_str_mv | 10.1134/S1063784218070095 |
| format | Article |
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2
FeSi or Co
2
MnSi Heusler alloy of the stoichiometric composition, which can be used for fabrication of spin electronic devices by high-frequency magnetron deposition and pulsed laser deposition of thin films.</description><identifier>ISSN: 1063-7842</identifier><identifier>EISSN: 1090-6525</identifier><identifier>DOI: 10.1134/S1063784218070095</identifier><language>eng</language><publisher>Moscow: Pleiades Publishing</publisher><subject>Classical and Continuum Physics ; Electron spin ; Electronic devices ; Heusler alloys ; Physical Science of Materials ; Physics ; Physics and Astronomy ; Pulsed laser deposition ; Sputtering ; Thin films</subject><ispartof>Technical physics, 2018-07, Vol.63 (7), p.1002-1005</ispartof><rights>Pleiades Publishing, Ltd. 2018</rights><rights>Copyright Springer Science & Business Media 2018</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c316t-b35720dc6cc1623c5f5eea73b5359b79f70bb8e3ab55c88d1eca4bbe09d4c6f73</citedby><cites>FETCH-LOGICAL-c316t-b35720dc6cc1623c5f5eea73b5359b79f70bb8e3ab55c88d1eca4bbe09d4c6f73</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1134/S1063784218070095$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1134/S1063784218070095$$EHTML$$P50$$Gspringer$$H</linktohtml><link.rule.ids>314,777,781,27905,27906,41469,42538,51300</link.rule.ids></links><search><creatorcontrib>Demidov, E. S.</creatorcontrib><creatorcontrib>Sdobnyakov, V. V.</creatorcontrib><creatorcontrib>Vazenmiller, G. V.</creatorcontrib><creatorcontrib>Chigirinskii, Yu. I.</creatorcontrib><creatorcontrib>Dudin, Yu. A.</creatorcontrib><creatorcontrib>Lesnikov, V. P.</creatorcontrib><creatorcontrib>Trushin, V. N.</creatorcontrib><creatorcontrib>Boldin, M. S.</creatorcontrib><creatorcontrib>Belkin, O. A.</creatorcontrib><creatorcontrib>Bobrov, A. A.</creatorcontrib><creatorcontrib>Sakharov, N. V.</creatorcontrib><title>Manufacturing of Sputtering Composite Targets Containing Phases of Co2FeSi or Co2MnSi Heusler Alloy</title><title>Technical physics</title><addtitle>Tech. Phys</addtitle><description>The paper presents a method for manufacturing mechanically strong sputtering composite targets containing the phase of the Co
2
FeSi or Co
2
MnSi Heusler alloy of the stoichiometric composition, which can be used for fabrication of spin electronic devices by high-frequency magnetron deposition and pulsed laser deposition of thin films.</description><subject>Classical and Continuum Physics</subject><subject>Electron spin</subject><subject>Electronic devices</subject><subject>Heusler alloys</subject><subject>Physical Science of Materials</subject><subject>Physics</subject><subject>Physics and Astronomy</subject><subject>Pulsed laser deposition</subject><subject>Sputtering</subject><subject>Thin films</subject><issn>1063-7842</issn><issn>1090-6525</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2018</creationdate><recordtype>article</recordtype><recordid>eNp1kF1LwzAUhoMoOKc_wLuC19V8NEl7OYpzgw2FzeuSZKezo2tqkl7s39s4wQvx6rzn430PPAjdE_xICMueNgQLJvOMkhxLjAt-gSYEFzgVnPLLqAVL4_4a3Xh_wJiQnIsJMmvVDbUyYXBNt09snWz6IQT47kp77K1vAiRb5fYQ_Djpgmq6uHz7UB58dJSWzmHTJNZFue5GuYDBt-CSWdva0y26qlXr4e6nTtH7_HlbLtLV68uynK1Sw4gIqWZcUrwzwhgiKDO85gBKMs0ZL7Qsaom1zoEpzbnJ8x0BozKtARe7zIhasil6OOf2zn4O4EN1sIPrxpcVxTIbU-jIaorI-co4672Duupdc1TuVBFcRZbVH5ajh549vo9gwP0m_2_6ApiediQ</recordid><startdate>20180701</startdate><enddate>20180701</enddate><creator>Demidov, E. S.</creator><creator>Sdobnyakov, V. V.</creator><creator>Vazenmiller, G. V.</creator><creator>Chigirinskii, Yu. I.</creator><creator>Dudin, Yu. A.</creator><creator>Lesnikov, V. P.</creator><creator>Trushin, V. N.</creator><creator>Boldin, M. S.</creator><creator>Belkin, O. A.</creator><creator>Bobrov, A. A.</creator><creator>Sakharov, N. V.</creator><general>Pleiades Publishing</general><general>Springer Nature B.V</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20180701</creationdate><title>Manufacturing of Sputtering Composite Targets Containing Phases of Co2FeSi or Co2MnSi Heusler Alloy</title><author>Demidov, E. S. ; Sdobnyakov, V. V. ; Vazenmiller, G. V. ; Chigirinskii, Yu. I. ; Dudin, Yu. A. ; Lesnikov, V. P. ; Trushin, V. N. ; Boldin, M. S. ; Belkin, O. A. ; Bobrov, A. A. ; Sakharov, N. V.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c316t-b35720dc6cc1623c5f5eea73b5359b79f70bb8e3ab55c88d1eca4bbe09d4c6f73</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2018</creationdate><topic>Classical and Continuum Physics</topic><topic>Electron spin</topic><topic>Electronic devices</topic><topic>Heusler alloys</topic><topic>Physical Science of Materials</topic><topic>Physics</topic><topic>Physics and Astronomy</topic><topic>Pulsed laser deposition</topic><topic>Sputtering</topic><topic>Thin films</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Demidov, E. S.</creatorcontrib><creatorcontrib>Sdobnyakov, V. V.</creatorcontrib><creatorcontrib>Vazenmiller, G. V.</creatorcontrib><creatorcontrib>Chigirinskii, Yu. I.</creatorcontrib><creatorcontrib>Dudin, Yu. A.</creatorcontrib><creatorcontrib>Lesnikov, V. P.</creatorcontrib><creatorcontrib>Trushin, V. N.</creatorcontrib><creatorcontrib>Boldin, M. S.</creatorcontrib><creatorcontrib>Belkin, O. A.</creatorcontrib><creatorcontrib>Bobrov, A. A.</creatorcontrib><creatorcontrib>Sakharov, N. V.</creatorcontrib><collection>CrossRef</collection><jtitle>Technical physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Demidov, E. S.</au><au>Sdobnyakov, V. V.</au><au>Vazenmiller, G. V.</au><au>Chigirinskii, Yu. I.</au><au>Dudin, Yu. A.</au><au>Lesnikov, V. P.</au><au>Trushin, V. N.</au><au>Boldin, M. S.</au><au>Belkin, O. A.</au><au>Bobrov, A. A.</au><au>Sakharov, N. V.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Manufacturing of Sputtering Composite Targets Containing Phases of Co2FeSi or Co2MnSi Heusler Alloy</atitle><jtitle>Technical physics</jtitle><stitle>Tech. Phys</stitle><date>2018-07-01</date><risdate>2018</risdate><volume>63</volume><issue>7</issue><spage>1002</spage><epage>1005</epage><pages>1002-1005</pages><issn>1063-7842</issn><eissn>1090-6525</eissn><abstract>The paper presents a method for manufacturing mechanically strong sputtering composite targets containing the phase of the Co
2
FeSi or Co
2
MnSi Heusler alloy of the stoichiometric composition, which can be used for fabrication of spin electronic devices by high-frequency magnetron deposition and pulsed laser deposition of thin films.</abstract><cop>Moscow</cop><pub>Pleiades Publishing</pub><doi>10.1134/S1063784218070095</doi><tpages>4</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 1063-7842 |
| ispartof | Technical physics, 2018-07, Vol.63 (7), p.1002-1005 |
| issn | 1063-7842 1090-6525 |
| language | eng |
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| source | SpringerLink Journals - AutoHoldings |
| subjects | Classical and Continuum Physics Electron spin Electronic devices Heusler alloys Physical Science of Materials Physics Physics and Astronomy Pulsed laser deposition Sputtering Thin films |
| title | Manufacturing of Sputtering Composite Targets Containing Phases of Co2FeSi or Co2MnSi Heusler Alloy |
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